IP Library Granted Patent US 9,508,926
Granted Patent B2
US 9,508,926 · App. 14/637,254 · Granted Nov 29, 2016

Magnetoresistive effect element having an underlayer and a side wall layer that contain scandium

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Quick Facts
Patent No.
US 9,508,926
App. No.
14/637,254
Granted
Nov 29, 2016
Kind
B2
Abstract

A magnetoresistive effect element includes a recording layer having magnetic anisotropy and a variable magnetization direction, a reference layer having magnetic anisotropy and an invariable magnetization direction, an intermediate layer between the recording layer and the reference layer, an underlayer containing scandium (Sc) and disposed on a surface side of the recording layer opposite to a surface side on which the recording layer is disposed, and a side wall layer containing an oxide of Sc and disposed on side surfaces of the recording layer and the intermediate layer.

Claims (59)

1. A magnetoresistive effect element comprising:

a recording layer having magnetic anisotropy and a variable magnetization direction;

a reference layer having magnetic anisotropy and an invariable magnetization direction;

an intermediate layer between the recording layer and the reference layer;

an underlayer containing scandium (Sc) and disposed on a surface side of the recording layer opposite to a surface side on which the reference layer is disposed; and

a side wall layer containing an oxide of Sc and disposed on side surfaces of the recording layer and the intermediate layer, wherein

the underlayer and the side wall layer include an alloy of scandium-hafnium boron (ScHfB) that has Sc as a main component.

2. The magnetoresistive effect element according to claim 1 , wherein

a content percentage of boron (B) included in the underlayer is higher than a content percentage of B included in the side wall layer.

3. The magnetoresistive effect element according to claim 1 , wherein

a resistance of the underlayer is lower than a resistance of the intermediate layer.

4. The magnetoresistive effect element according to claim 1 , wherein

the underlayer includes microcrystal grains, all of which are 3 nm or less.

5. The magnetoresistive effect element according to claim 1 , wherein

the underlayer has an amorphous structure.

6. The magnetoresistive effect element according to claim 1 , further comprising:

a layer of aluminum nitride (AlN) disposed between the underlayer and the recording layer.

7. The magnetoresistive effect element according to claim 1 , further comprising:

a layer of aluminum scandium nitride (AlScN) between the underlayer and the recording layer; and

a layer of aluminum nitride (AlN) between the layer of aluminum scandium nitride and the recording layer.

8. The magnetoresistive effect element according to claim 1 , wherein

a crystallization degree of the recording layer is lower than a crystallization degree of the reference layer.

9. The magnetoresistive effect element according to claim 1 , wherein

crystal grains of the recording layer are smaller than crystal grains of the reference layer.

10. The magnetoresistive effect element according to claim 1 , further comprising:

a second side wall layer disposed on an outer surface of the side wall layer,

wherein the second side wall layer is more susceptible to oxidization than the intermediate layer.

11. A magnetoresistive effect element comprising:

a recording layer having magnetic anisotropy and a variable magnetization direction;

a reference layer having magnetic anisotropy and an invariable magnetization direction;

an intermediate layer between the recording layer and the reference layer;

an underlayer containing scandium (Sc) and disposed on a surface side of the recording layer opposite to a surface side on which the reference layer is disposed;

a layer of aluminum scandium nitride (AlScN) between the underlayer and the recording layer;

a layer of aluminum nitride (AlN) between the layer of aluminum scandium nitride and the recording layer; and

a side wall layer containing an oxide of Sc and disposed on side surfaces of the recording layer and the intermediate layer.

12. The magnetoresistive effect element according to claim 11 , wherein

a resistance of the underlayer is lower than a resistance of the intermediate layer.

13. The magnetoresistive effect element according to claim 11 , wherein

the underlayer includes microcrystal grains, all of which are 3 nm or less.

14. The magnetoresistive effect element according to claim 11 , wherein

the underlayer has an amorphous structure.

15. The magnetoresistive effect element according to claim 11 , wherein

a crystallization degree of the recording layer is lower than a crystallization degree of the reference layer.

16. The magnetoresistive effect element according to claim 11 , wherein

crystal grains of the recording layer are smaller than crystal grains of the reference layer.

17. The magnetoresistive effect element according to claim 11 , further comprising:

a second side wall layer disposed on an outer surface of the side wall layer,

wherein the second side wall layer is more susceptible to oxidization than the intermediate layer.

18. A magnetoresistive effect element comprising:

a recording layer having magnetic anisotropy and a variable magnetization direction;

a reference layer having magnetic anisotropy and an invariable magnetization direction, crystal grains of the recording layer being smaller than crystal grains of the reference layer;

an intermediate layer between the recording layer and the reference layer;

an underlayer containing scandium (Sc) and disposed on a surface side of the recording layer opposite to a surface side on which the reference layer is disposed; and

a side wall layer containing an oxide of Sc and disposed on side surfaces of the recording layer and the intermediate layer.

19. The magnetoresistive effect element according to claim 18 , wherein

a crystallization degree of the recording layer is lower than a crystallization degree of the reference layer.

20. The magnetoresistive effect element according to claim 18 , further comprising:

a second side wall layer disposed on an outer surface of the side wall layer,

wherein the second side wall layer is more susceptible to oxidization than the intermediate layer.

Assignments (5)
MERGER Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 14, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043194/0647 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 19, 2015
From: KITAGAWA, EIJI; AMANO, MINORU; YAKABE, MEGUMI; MAEKAWA, HIROAKI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 035673/0022 →