Evaluating a vessel for suitability for containing fluid

1. A method for evaluating a vessel for suitability to contain a fluid, the method comprising:

providing a vessel;

forming a polished surface portion of the vessel by removing oxidation and/or one or more contaminants from a portion of the vessel;

placing a sleeve of a mounting apparatus in contact with a vessel;

placing a probe head of a laser device in the sleeve such that a tip of the probe head is in contact with the polished surface portion of the vessel through an opening of the sleeve;

applying, after the probe head is in contact with the polished surface portion of the vessel through the opening of the sleeve, a focused laser from the laser device to the polished surface portion to form a plasma on the polished surface portion; and

determining whether the vessel is suitable for containing a fluid based on silicon content of the polished surface portion, wherein the silicon content is determined based on light emitted from the plasma.

2. The method of claim 1 , wherein the silicon content is estimated based on an intensity level of the light emitted from the plasma and compared to a calibration curve.

3. The method of claim 2 , wherein a calibration curve is generated from light intensity-versus-wavelength calibration spectra based on a component containing a respective known weight percentage of silicon and wherein different emission spectra correspond to different weight percentages of silicon.

4. The method of claim 2 , wherein a portion of each calibration curve that corresponds to a wavelength range of approximately 288.15 nanometer (nm) to approximately 288.3 nm is used to determine whether the silicon content of the polished surface portion is at least a threshold weight percent.

5. The method of claim 1 , further comprising:

determining intensity level of existing light prior to applying the focused laser to the polished surface portion; and

subtracting the intensity level of existing light from intensity level of light determined after applying the focused laser to determine the intensity level of the light emitted from the plasma.

6. The method of claim 1 , wherein the vessel is used in a sulfidation service.

7. The method of claim 6 , wherein determining whether the vessel is suitable for containing the fluid comprises determining whether the silicon content of the polished surface portion is at least 0.10 weight percent.

8. The method of claim 1 , wherein applying the focused laser to the polished surface portion includes applying a laser pulse once every three seconds, wherein the laser pulse has a width of between 5 nanoseconds and 8 nanoseconds.

9. The method of claim 8 , wherein the laser pulse has approximately 25 millijoules of energy.

10. The method of claim 8 , wherein applying the focused laser to the polished surface portion includes applying ten laser pulses.

11. A method for evaluating a vessel for suitability to contain a fluid, the method comprising:

placing a sleeve of a mounting apparatus in contact with a vessel;

extending a cable around the vessel from a first side of the sleeve to a second side of the sleeve, wherein a first portion of the cable is attached to the sleeve on the first side of the sleeve;

attaching a second portion of the cable to the sleeve on the second side of the sleeve;

placing a probe head of a laser device in the sleeve such that a tip of the probe head is in contact with the vessel through an opening of the sleeve;

tightening the cable by moving the second portion of the cable in a direction away from the opening of the sleeve;

applying a laser to a polished surface portion of the vessel to form a plasma; and

determining whether the vessel is suitable for containing a fluid based on silicon content of the polished surface portion, wherein the silicon content is estimated based on light emitted from the plasma.

12. The method of claim 11 , further comprising forming a polished surface portion of the vessel to remove oxidation and/or one or more contaminants from a portion of the vessel.

13. The method of claim 12 , further comprising applying a focused laser to the polished surface portion to form a plasma on the polished surface portion.

14. The method of claim 11 , wherein the vessel has a temperature of up to or 450° F. or greater.

15. The method of claim 11 , wherein determining whether the vessel is suitable for containing the fluid comprises determining whether the silicon content of the polished surface portion is at least 0.10 weight percent.