Polarization-adjusted beam operation for materials processing

1. A system for processing a workpiece, the system comprising:

a beam emitter;

a positioning device for varying a position, of a beam of the beam emitter, at which the beam is emitted onto a surface of the workpiece;

a variable polarizer for varying a polarization of the beam; and

a controller, coupled to the positioning device and the polarizer, for (i) operating the beam emitter to cause the beam to traverse a path across at least a portion of the surface of the workpiece for processing thereof, the path including one or more directional changes, and (ii) maintaining a consistent polarization of the beam with respect to the workpiece along the path, the controller being configured to alter the polarization of the beam at each directional change,

wherein (i) a composition and/or a thickness of the workpiece changes at one or more points along the path, and (ii) the controller is configured to alter the polarization of the beam at the one or more points.

2. The system of claim 1 , wherein the variable polarizer comprises a wave plate and a rotation element, the rotation element being operated by the controller.

3. The system of claim 2 , wherein the wave plate is a half-wave plate.

4. The system of claim 2 , wherein the wave plate is a quarter-wave plate.

5. The system of claim 2 , wherein the beam is linearly polarized and the controller operates the rotation element to maintain a polarization direction parallel to the path.

6. The system of claim 1 , further comprising:

a memory, accessible to the controller, for storing data corresponding to the path; and

a database for storing polarization data for a plurality of materials,

wherein the controller is configured to query the database to obtain the polarization data for a material of the workpiece, the polarization data determining the consistent polarization of the beam.

7. The system of claim 1 , wherein the beam emitter emits a plurality of beams.

8. The system of claim 1 , wherein the beam emitter is at least one laser.

9. The system of claim 1 , wherein the beam emitter is at least one polarized fiber.

10. A method of processing a workpiece, the method comprising the steps of:

operating a beam emitter to direct a beam traversing a path along at least a portion of a surface of the workpiece to process the workpiece, the beam having an output polarization; and

altering the output polarization along at least a portion of the path so as to maintain a consistent polarization of the beam with respect to the workpiece throughout processing thereof,

wherein (i) a composition and/or a thickness of the workpiece changes at one or more points along the path, and (ii) the output polarization is altered at the one or more points.

11. The method of claim 10 , wherein processing the workpiece comprises at least one of cutting, welding, soldering, drilling, or etching the workpiece.

12. The method of claim 10 , wherein the altering step comprises directing the beam through a wave plate and varying a rotation angle of the wave plate with respect to the beam.

13. The method of claim 12 , wherein the wave plate is a half-wave plate.

14. The method of claim 12 , wherein the wave plate is a quarter-wave plate.

15. The method of claim 10 , wherein the beam is linearly polarized and the altering step maintains a polarization direction of the beam parallel to the path.

16. The method of claim 10 , further comprising the steps of:

storing data corresponding to the path;

storing polarization data for a plurality of materials; and

querying the database to obtain the polarization data for a material of the workpiece, the polarization data determining the consistent polarization of the beam.

17. The method of claim 10 , wherein the path includes at least one directional change.