IP Library Granted Patent US 9,324,908
Granted Patent B2
US 9,324,908 · App. 14/653,703 · Granted Apr 26, 2016

Nitride semiconductor light-emitting element

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Quick Facts
Patent No.
US 9,324,908
App. No.
14/653,703
Granted
Apr 26, 2016
Kind
B2
Abstract

Provided is a nitride semiconductor light-emitting element including in order a first n-type nitride semiconductor layer, a second n-type nitride semiconductor layer, an n-type electron-injection layer, a light-emitting layer, and a p-type nitride semiconductor layer, wherein the average n-type dopant concentration of the second n-type nitride semiconductor layer is 0.53 times or less as high as the average n-type dopant concentration of the first n-type nitride semiconductor layer, and the average n-type dopant concentration of the n-type electron-injection layer is 1.5 times or more as high as the average n-type dopant concentration of the second n-type nitride semiconductor layer.

Claims (11)

1. A nitride semiconductor light-emitting element comprising in order:

a first n-type nitride semiconductor layer,

a second n-type nitride semiconductor layer,

an n-type electron-injection layer, said n-type electron-injection layer having a larger band gap than said second n-type nitride semiconductor layer, said n-type electron-injection layer containing Al,

a light-emitting layer, and

a p-type nitride semiconductor layer,

the average n-type dopant concentration of said second n-type nitride semiconductor layer being equal to or less than 0.53 times the average n-type dopant concentration of said first n-type nitride semiconductor layer, and

the average n-type dopant concentration of said n-type electron-injection layer being at least 1.5 times the average n-type dopant concentration of said second n-type nitride semiconductor layer.

2. The nitride semiconductor light-emitting element according to claim 1 , wherein said light-emitting layer includes a quantum well layer and a barrier layer, and said barrier layer is made of a nitride semiconductor containing Ga and Al.

3. The nitride semiconductor light-emitting element according to claim 1 , wherein the thickness of said n-type electron-injection layer is between 10 nm and 100 nm.

4. The nitride semiconductor light-emitting element according to claim 1 , wherein an emission peak wavelength of said nitride semiconductor light-emitting element is between 250 nm and 445 nm.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 10, 2022
From: SHARP KABUSHIKI KAISHA
To: SHARP FUKUYAMA LASER CO., LTD.
Reel/Frame 059039/0927 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 17, 2015
From: WATANABE, MASANORI; KOMADA, SATOSHI; INOUE, TOMOYA; KAWABATA, KOSUKE
To: SHARP KABUSHIKI KAISHA
Reel/Frame 036120/0101 →