Method of making a MEMS die having a MEMS device on a suspended structure
View Patent ↗A microelectromechanical systems (MEMS) die includes a substrate having a first substrate layer, a second substrate layer, and an insulator layer interposed between the first and second substrate layers. A structure is formed in the first substrate layer and includes a platform upon which a MEMS device resides. Fabrication methodology entails forming the MEMS device on a front side of the first substrate layer of the substrate, forming openings extending through the second substrate layer from a back side of the second substrate layer to the insulator layer, and forming a trench in the first substrate layer extending from the front side to the insulator layer. The trench is laterally offset from the openings. The trench surrounds the MEMS device to produce the structure in the first substrate layer on which the MEMS device resides. The insulator layer is removed underlying the structure to suspend the structure.
1. A method of making a microelectromechanical systems (MEMS) die comprising:
forming a MEMS device on a substrate, said substrate having a first substrate layer, a second substrate layer and an insulator layer interposed between said first and second substrate layers, and said MEMS device being formed on a front side said first substrate layer;
forming openings extending through said second substrate layer from a back side of said second substrate layer to said insulator layer;
forming a trench in said first substrate layer extending from said front side to said insulator layer, said trench surrounding said MEMS device to produce a structure in said first substrate layer on which said MEMS device resides; and
removing said insulator layer underlying said structure to suspend said structure.
2. The method of claim 1 further comprising utilizing a layered silicon-on-insulator (SOI) substrate as said substrate.
3. The method of claim 1 wherein said forming said trench comprises laterally offsetting said trench from said openings.
4. The method of claim 1 wherein said forming said openings and said forming said trench does not remove said insulator layer underlying said structure.
5. The method of claim 1 wherein said removing is performed following said forming said openings and said forming said trench.
6. The method of claim 1 wherein said removing operation comprises performing a buffered oxide etch process using a liquid etchant to remove said insulator layer.
7. The method of claim 6 wherein said removing operation further comprises performing a vapor phase etch process following said buffered oxide etch process.
8. The method of claim 1 wherein said removing operation comprises performing a vapor phase etch process to remove said insulator layer.
9. The method of claim 1 wherein said removing operation comprises performing a sacrificial etch process to remove said insulator layer.
10. The method of claim 1 wherein said forming said trench produces said structure having a platform and a coupling member extending from said platform, said coupling member coupling said platform to a portion of said first substrate layer surrounding said trench.
11. The method of claim 10 wherein said coupling member is a sole attachment point of said platform to said portion of said first substrate layer.
12. The method of claim 10 wherein said coupling member comprises at least one compliant member interconnected between said platform and said portion of said first substrate layer surrounding said trench.
13. A method of making a microelectromechanical systems (MEMS) die comprising:
forming a MEMS device on a silicon-on-insulator (SOI) substrate, said SOI substrate having a first silicon layer, a second silicon layer and an insulator layer interposed between said first and second silicon layers, and said MEMS device being formed on a front side said first silicon layer;
forming openings extending through said second silicon layer from a back side of said second silicon layer to said insulator layer;
forming a trench in said first silicon layer extending from said front side to said insulator layer, said trench being laterally offset from said openings, and said trench surrounding said MEMS device to produce a structure in said first silicon layer on which said MEMS device resides; and
removing said insulator layer underlying said structure to suspend said structure.
14. The method of claim 13 wherein said forming said openings and said forming said trench does not remove said insulator layer underlying said structure, and said removing is performed following said forming said openings and said forming said trench.
15. The method of claim 13 wherein said forming said trench produces said structure having a platform and a coupling member extending from said platform, said coupling member coupling said platform to a portion of said first silicon layer surrounding said trench.
16. The method of claim 15 wherein said coupling member is a sole attachment point of said platform to said portion of said first substrate layer.
17. The method of claim 15 wherein said coupling member comprises at least one compliant member interconnected between said platform and said portion of said first substrate layer surrounding said trench.