Reticle chuck cleaner
View Patent ↗According to one embodiment, a reticle chuck cleaner for cleaning a reticle chuck of an EUV exposure apparatus includes a substrate having a shape to be carried to the reticle chuck of the EUV exposure apparatus, and an adhesive formed on one of the main surfaces of the substrate.
1. A reticle chuck cleaner manufacturing method comprising:
preparing a substrate having a shape to be carried to a reticle chuck of an EUV exposure apparatus, the substrate having a multi-layered film functioning as a reflection layer, a capping layer for surface protection and an optical absorption member on a first main surface of the substrate,
forming an adhesive on a second main surface of the substrate, the second main surface being opposite to the first surface, and
subjecting the substrate on which the adhesive is formed to a heating process under vacuum to reduce emission gas from the adhesive.
2. The method according to claim 1 , further including forming an alignment mark used at a carriage time of a reticle of the EUV exposure apparatus on the first surface of the substrate before the adhesive is formed.
3. The method according to claim 1 , wherein the optical absorption member is processed into a pattern of an alignment mark to form the alignment mark.
4. The method according to claim 1 , further including eliminating a portion of the adhesive that is formed on an end region of the substrate after the substrate is subjected to the heating process.
5. The method according to claim 1 , further including subjecting the adhesive to an aging process to strengthen cohesive power of the adhesive after the substrate is subjected to the heating process.
6. The method according to claim 1 , wherein the adhesive is one of acrylic, urethane and silicone.
7. The method according to claim 1 , further including forming a metal film as an electrode of an electrostatic chuck on the second surface of the substrate before forming the adhesive and the adhesive is formed on the metal film.
8. The method according to claim 1 , wherein a region in which the adhesive is formed is not smaller than a chucking region of the reticle chuck of the EUV exposure apparatus.
9. The method according to claim 1 , wherein the adhesive is not formed in a portion that is held by a carriage mechanism at a carriage time of the reticle.