Lower side wall for epitaxial growth apparatus
Embodiments described herein relate to a lower side wall for use in a processing chamber. In one embodiment, the lower side wall includes an annular body. The annular body as an inner circumference, an outer circumference, a plurality of flanges projecting from the inner circumference, and a first concave portion formed in the outer circumference. The outer circumference has a plurality of grooves arranged in a circumferential direction of the lower side wall. In another embodiment, the annular body further includes a top surface having a mounting surface formed thereon and a second concave portion formed opposite the first concave portion. The second concave portion has a plurality of purge holes. In another embodiment, each groove of the plurality of grooves formed in the first concave portion has an arc shape.
1. A lower side wall for use in a processing chamber, the lower side wall comprising:
an annular body comprising:
an inner circumference;
an outer circumference concentric with the inner circumference and sharing a center axis; and
a first concave portion formed in the outer circumference, the first concave portion further comprising:
a plurality of grooves formed in the first concave portion and isolated from the inner circumference by the annular body, the grooves arranged substantially parallel to the center axis along a circumferential direction of the lower side wall, wherein each groove has a cross-sectional curved profile, the cross-sectional profile of a first groove of the plurality of grooves and a last groove of the plurality of grooves are radially aligned with the center axis, and the plurality of grooves are formed continuously in the first concave portion.
2. The lower side wall of claim 1 , further comprising:
a second concave portion formed in the outer circumference, the second concave portion formed opposite the first concave portion.
3. The lower side wall of claim 2 , wherein the second concave portion further comprises:
a plurality of purge holes formed therethrough.
4. The lower side wall of claim 1 , wherein each groove is curved in a width direction to form the cross-sectional curved profile.
5. The lower side wall of claim 1 , wherein each groove has a depth ranging from 1 mm to 5 mm.
6. The lower side wall of claim 1 , wherein the plurality of grooves are formed toward a center of the lower side wall.
7. The lower side wall of claim 1 , wherein a center of rotation for the cross-sectional curved profile of each groove is incongruent with that of an adjacent groove.
8. A lower side wall for use in a processing chamber, the lower side wall comprising:
an annular body comprising: an inner circumference;
an outer circumference concentric with the inner circumference and sharing a center axis;
a top surface, the top surface having a mounting surface formed thereon; a first concave portion formed in the outer circumference, the first concave portion further comprising:
a plurality of grooves formed in the first concave portion and isolated from the inner circumference by the annular body, the grooves arranged substantially parallel to the center axis along a circumferential direction of the lower side wall, wherein each groove has a cross-sectional curved profile, the cross-sectional profile of a first groove of the plurality of grooves and a last groove of the plurality of grooves are radially aligned with the center axis axis, and the plurality of grooves are formed continuously in the first concave portion; and
a second concave portion formed in the outer circumference, the second concave portion formed opposite the first concave portion, the second concave portion further comprising:
a plurality of purge holes formed from the inner circumference through to the outer circumference.
9. The lower side wall of claim 8 , wherein the cross-sectional curved profile of each groove concentrates a gas when the gas contacts the plurality of grooves.
10. The lower side wall of claim 9 , wherein each groove is curved in a width direction to form the cross-sectional curved profile.
11. The lower side wall of claim 8 , wherein each groove has a depth ranging from 1 mm to 5 mm.