Semiconductor transistor and flash memory, and manufacturing method thereof

1. A semiconductor transistor, comprising:

a stacked gate structure, disposed on a substrate, and comprising a gate dielectric layer, a first conductive layer, a dielectric layer and a second conductive layer sequentially disposed on the substrate, wherein the dielectric layer has an opening there around such that the first conductive layer is electrically connected to the second conductive layer;

lightly doped regions, respectively disposed in the substrate under the opening at sides of the stacked gate structure; and

source/drain regions, disposed in the substrate at sides of the stacked gate structure.

2. The semiconductor transistor as claimed in claim 1 , wherein the semiconductor transistor is a middle operating voltage transistor or a high operating voltage transistor.

3. The semiconductor transistor as claimed in claim 1 , wherein the dielectric layer is silicon oxide/silicon nitride/silicon oxide.

4. A manufacturing method for a semiconductor transistor, comprising:

providing a substrate;

sequentially forming a gate dielectric layer, a first conductive layer and a dielectric layer on the substrate;

removing a part of the dielectric layer to an opening exposing the first conductive layer which surrounds the dielectric layer;

forming a second conductive layer on the substrate, wherein the second conductive layer is electrically connected to the first conductive layer though the opening;

patterning the second conductive layer, the first conductive layer and the gate dielectric layer to form a stacked gate structure, wherein the dielectric layer is located in the stacked gate structure;

forming lightly doped regions in the substrate under the opening at sides of the stacked gate structure; and

forming source/drain regions in the substrate at sides of the stacked gate structure.

5. The manufacturing method for the semiconductor transistor as claimed in claim 4 , wherein the dielectric layer is silicon oxide/silicon nitride/silicon oxide.

6. The manufacturing method for the semiconductor transistor as claimed in claim 4 , wherein the step of forming the lightly doped regions in the substrate under the opening at sides of the stacked gate structure comprises:

performing a tilt angle ion implantation by using the dielectric layer as a mask.

7. The manufacturing method for the semiconductor transistor as claimed in claim 4 , wherein the step of removing a part of the dielectric layer to form the opening exposing the first conductive layer further comprises:

removing a part of the first conductive layer.

8. A flash memory, disposed on a substrate, wherein the substrate comprises a memory cell region, a first circuit region and a second circuit region, the flash memory comprising:

a memory unit, disposed in the memory cell region, and comprising a tunnelling dielectric layer, a floating gate, an inter-gate dielectric layer and a control gate sequentially disposed on the substrate;

a first semiconductor transistor, disposed in the first circuit region, and comprising:

a gate structure, disposed on a substrate, and comprising a first gate dielectric layer and a first gate sequentially disposed on the substrate

first source/drain regions, disposed in the substrate at sides of the gate structure; and

a second semiconductor transistor, disposed in the second circuit region, and comprising:

a stacked gate structure, disposed on a substrate, and comprising a second gate dielectric layer, a first conductive layer, a dielectric layer and a second conductive layer sequentially disposed on the substrate, wherein the dielectric layer has an opening there around such that the first conductive layer is electrically connected to the second conductive layer to form a second gate;

first lightly doped regions, disposed in the substrate under the opening at sides of the stacked gate structure; and

second source/drain regions, disposed in the substrate at sides of the stacked gate structure.

9. The flash memory as claimed in claim 8 , wherein materials of the inter-gate dielectric layer and the dielectric layer are the same.

10. The flash memory as claimed in claim 8 , wherein the height of the second gate is greater than the height of the first gate.

11. The flash memory as claimed in claim 8 , further comprising:

spacers, respectively disposed at sidewalls of the memory unit, the gate structure and the stacked gate structure.

12. The flash memory as claimed in claim 11 , wherein a width of the spacer of the second semiconductor transistor is greater than a width of the spacer of the first semiconductor transistor.

13. The flash memory as claimed in claim 8 , wherein the first semiconductor transistor is a standard operating voltage transistor.

14. The flash memory as claimed in claim 8 , wherein the second semiconductor transistor is a middle operating voltage transistor or a high operating voltage transistor.

15. The flash memory as claimed in claim 8 , wherein the first semiconductor transistor further includes second lightly doped regions disposed in the substrate between the gate structure and the first source/drain regions.

16. A manufacturing method for a flash memory, comprising:

providing a substrate, wherein the substrate comprises a memory cell region, a first circuit region and a second circuit region;

forming a first dielectric layer on the substrate at the second circuit region;

forming a second dielectric layer on the substrate at the memory cell region;

forming a third dielectric layer on the substrate at the first circuit region;

forming a first conductive layer on the substrate;

forming a dielectric layer is formed on the first conductive layer;

removing the dielectric layer in the first circuit region and a part of the dielectric layer in the second circuit region, and forming an opening exposing the first conductive layer around the dielectric layer at the second circuit region;

removing the first conductive layer in the first circuit region;

forming a second conductive layer on the substrate, wherein in the second circuit region, the second conductive layer is electrically connected to the first conductive layer through the opening;

patterning the second conductive layer, the dielectric layer and the first conductive layer to form a memory unit in the memory cell region, a gate structure in the first circuit region and a stacked gate structure in the second circuit region, wherein the dielectric layer is located in the stacked gate structure with the opening;

forming lightly doped regions in the substrate under the opening at sides the of the stacked gate structure; and

forming source/drain regions in the substrate at sides of the stacked gate structure.

17. The manufacturing method for the flash memory as claimed in claim 16 , wherein the dielectric layer is silicon oxide/silicon nitride/silicon oxide.

18. The manufacturing method for the flash memory as claimed in claim 16 , wherein the step of forming the lightly doped regions in the substrate under the opening at sides of the stacked gate structure comprises:

performing a tilt angle ion implantation by using the dielectric layer as a mask.

19. The manufacturing method for the flash memory as claimed in claim 16 , wherein the step of removing a part of the dielectric layer to form the opening exposing the first conductive layer further comprises:

removing a part of the first conductive layer.