Semiconductor device and a method of manufacturing the same
For simplifying the dual-damascene formation steps of a multilevel Cu interconnect, a formation step of an antireflective film below a photoresist film is omitted. Described specifically, an interlayer insulating film is dry etched with a photoresist film formed thereover as a mask, and interconnect trenches are formed by terminating etching at the surface of a stopper film formed in the interlayer insulating film. The stopper film is made of an SiCN film having a low optical reflectance, thereby causing it to serve as an antireflective film when the photoresist film is exposed.
1. A semiconductor integrated circuit device, comprising:
(a) a first interconnect made of a first metal film and formed over a main surface of a semiconductor substrate;
(b) a first interlayer insulating film formed over the first interconnect;
(c) a first via hole formed in the first interlayer insulating film and connected to the first interconnect;
(d) a first interconnect trench formed in the first interlayer insulating film in a region including a region in which the first via hole has been formed;
(e) a second interconnect formed by filling a second metal film in the first interconnect trench and the first via hole;
(f) a third interconnect made of a third metal film and formed over the second interconnect and the first interlayer insulating film;
(g) a second interlayer insulating film formed over the third interconnect;
(h) a second via hole formed in the second interlayer insulating film and connected to the third interconnect;
(i) a second interconnect trench formed in the second interlayer insulating film in a region including a region in which the second via hole has been formed; and
(j) a fourth interconnect formed by filling a fourth metal film in the second interconnect trench and the second via hole,
wherein the second interlayer insulating film is thicker than the first interlayer insulating film,
wherein an etching stopper film is formed in the second interlayer insulating film,
wherein a bottom of the second interconnect trench is arranged near the etching stopper film,
wherein the first interlayer insulating film has no etching stopper film formed therein,
wherein a depth of the second interconnect trench is greater than a depth of the first interconnect trench,
wherein a dielectric constant of the first interlayer insulating film is lower than a dielectric constant of the second interlayer insulating film,
wherein a diameter of the second via hole is greater than a diameter of the first via hole,
wherein the first, second, third and fourth metal films have copper as a main component,
wherein the first interlayer insulating film has a first barrier insulating film which prevents diffusion of copper, the first barrier insulating film being in contact with a surface of the first interconnect and including silicon, carbon and nitrogen,
wherein the second interlayer insulating film has a second barrier insulating film which prevents diffusion of copper, the second barrier insulating film being in contact with a surface of the third interconnect, and
wherein the etching stopper film includes silicon and nitrogen and is formed of a different material from the first and second barrier insulating films.
2. A semiconductor integrated circuit device according to claim 1 ,
further comprising a first barrier metal formed inside of the first interconnect trench and the first via hole and formed between the first interlayer insulating film and the second metal film.
3. A semiconductor integrated circuit device according to claim 1 ,
further comprising a second barrier metal formed inside of the second interconnect trench and the second via hole and formed between the second interlayer insulating film and the fourth metal film.
4. A semiconductor integrated circuit device according to claim 1 , wherein the first interconnect trench is shallower than the first via hole, and the second interconnect trench is shallower than the second via hole.
5. A semiconductor integrated circuit device according to claim 1 , wherein the second via hole is deeper than the first via hole.
6. A semiconductor integrated circuit device, comprising:
(a) a first interconnect made of a first metal film and formed over a semiconductor substrate;
(b) a first interlayer insulating film formed over the first interconnect:
(c) a first via hole for connecting to the first interconnect formed in the first interlayer insulating film;
(d) a first interconnect trench for connecting to the first via hole formed in the first interlayer insulating film;
(e) a second interconnect and a first connection portion formed together by filling a second metal film in the first interconnect trench and in the first via hole;
(f) a third interconnect made of a third metal film and formed over the second interconnect and the first interlayer insulating film;
(g) a second interlayer insulating film formed over the third interconnect;
(h) a second via hole for connecting to the third interconnect formed in the second interlayer insulating film;
(i) a second interconnect trench for connecting to the second via hole formed in the second interlayer insulating film; and
(j) a fourth interconnect and a second connection portion formed together by filling a fourth metal film in the second interconnect trench and in the second via hole;
wherein a thickness of the second interlayer insulating film is larger than a thickness of the first interlayer insulating film,
wherein the second interlayer insulating film is divided by a stopper film provided therein,
wherein a bottom of the fourth interconnect is arranged substantially at a level of the stopper film,
wherein the first interlayer insulating film has no stopper film formed therein,
wherein a bottom of the second interconnect is arranged on the first interlayer insulating film,
wherein a depth of the second interconnect trench is greater than a depth of the first interconnect trench,
wherein the first interlayer insulating film has an SiOC film as a main component,
wherein the second interlayer insulating film has a silicon oxide film or a fluorinated silicon oxide film as a main component,
wherein a diameter of the second via hole is greater than a diameter of the first via hole,
wherein the first, second, third and fourth metal films have copper as a main component,
wherein the first interlayer insulating film has a first barrier insulating film which prevents diffusion of copper, the first barrier insulating film being in contact with a surface of the first interconnect and including silicon, carbon and nitrogen,
wherein the second interlayer insulating film has a second barrier insulating film which prevents diffusion of copper, the second barrier insulating film being in contact with a surface of the third interconnect,
wherein the etching stopper film includes silicon and nitrogen and is formed of a different material from the first and second barrier insulating films.
7. A semiconductor integrated circuit device according to claim 6 ,
further comprising a first barrier metal formed inside of the first interconnect trench and the first via hole and formed between the first interlayer insulating film and the second metal film.
8. A semiconductor integrated circuit device according to claim 6 ,
further comprising a second barrier metal formed inside of the second interconnect trench and the second via hole and formed between the second interlayer insulating film and the fourth metal film.
9. A semiconductor integrated circuit device according to claim 6 , wherein the first interconnect trench is shallower than the first via hole, and the second interconnect trench is shallower than the second via hole.
10. A semiconductor integrated circuit device according to claim 6 , wherein the second via hole is deeper than the first via hole.
11. A semiconductor integrated circuit device, comprising:
(a) a first interconnect made of a first metal film and formed over a main surface of a semiconductor substrate;
(b) a first interlayer insulating film formed over the first interconnect;
(c) a first via hole formed in the first interlayer insulating film and connected to the first interconnect;
(d) a first interconnect trench formed in the first interlayer insulating film in a region including a region in which the first via hole has been formed;
(e) a second interconnect formed by filling a second metal film in the first interconnect trench and the first via hole;
(f) a third interconnect made of a third metal film and formed over the second interconnect and the first interlayer insulating film;
(g) a second interlayer insulating film formed over the third interconnect;
(h) a second via hole formed in the second interlayer insulating film and connected to the third interconnect;
(i) a second interconnect trench formed in the second interlayer insulating film in a region including a region in which the second via hole has been formed; and
(j) a fourth interconnect formed by filling a fourth metal film in the second interconnect trench and the second via hole,
wherein the second interlayer insulating film is thicker than the first interlayer insulating film,
wherein an etching stopper film is formed in the second interlayer insulating film,
wherein a bottom of the second interconnect trench is arranged near the etching stopper film,
wherein the first interlayer insulating film has no etching stopper film formed therein,
wherein a depth of the second interconnect trench is greater than a depth of the first interconnect trench,
wherein the first interlayer insulating film has an SiOC film as a main component,
wherein the second interlayer insulating film has a silicon oxide film or a fluorinated silicon oxide film as a main component,
wherein a diameter of the second via hole is greater than a diameter of the first via hole,
wherein the first, second, third and fourth metal films have copper as a main component,
wherein the first interlayer insulating film has a first barrier insulating film which prevents diffusion of copper, the first barrier insulating film being in contact with a surface of the first interconnect and including silicon, carbon and nitrogen,
wherein the second interlayer insulating film has a second barrier insulating film which prevents diffusion of copper, the second barrier insulating film being in contact with a surface of the third interconnect, and
wherein the etching stopper film is an SiN film or an SiON film, and is formed of a different material from the first and second barrier insulating films.
12. A semiconductor integrated circuit device according to claim 11 ,
further comprising a first barrier metal formed inside of the first interconnect trench and the first via hole and formed between the first interlayer insulating film and the second metal film.
13. A semiconductor integrated circuit device according to claim 11 ,
further comprising a second barrier metal formed inside of the second interconnect trench and the second via hole and formed between the second interlayer insulating film and the fourth metal film.
14. A semiconductor integrated circuit device according to claim 11 , wherein the first interconnect trench is shallower than the first via hole, and the second interconnect trench is shallower than the second via hole.
15. A semiconductor integrated circuit device according to claim 11 , wherein the second via hole is deeper than the first via hole.