Spectrometer with random beam profiles

1. An apparatus comprising:

a light source configured to emit a beam along a beam path through a sample volume comprising an analyte;

at least one detector positioned to detect at least a portion of the beam emitted by the light source;

at least one reflector positioned along the beam path intermediate the light source and the at least one detector, the at least one reflector having a surface roughness greater than about 20 Å RMS and less than a maximum surface roughness that prevents detection of a total power of the beam and a higher order harmonic signal of the beam by the at least one detector; and

a controller configured to perform operations comprising:

determining a ratio using the total power and the higher order signal impinging on the at least one detector, and

calculating a concentration of the analyte in the sample volume based on the ratio.

2. The apparatus of claim 1 , wherein the at least one reflector is integral to a housing of a sample cell of a spectrometer that also comprises the light source and detector.

3. The apparatus of claim 1 , wherein the at least one reflector is coupled to a housing of a sample cell of a spectrometer that also comprises the light source and detector.

4. The apparatus of claim 1 , wherein the at least one reflector has a radius of curvature varying from a predetermined radius of curvature by more than ±0.05%, ±0.075%, ±0.1%, ±0.15%, ±0.22%, ±0.5%, ±1%, ±1.5%, or ±2%.

5. The apparatus of claim 1 , wherein the predetermined radius of curvature is based on a spacing and position of the at least one reflector in relation to the at least one light source and/or at least one detector.

6. The apparatus of claim 1 , wherein the at least one reflector has a radius of curvature that is infinite or substantially infinite.

7. The apparatus of claim 1 , wherein at least a portion of the at least one reflector has a negative radius of curvature.

8. The apparatus of claim 1 , wherein at least a portion of the at least one reflector has a positive radius of curvature.

9. The apparatus of claim 1 , wherein at least a portion of the at least one reflector is cylindrical, aspheric, toroidal, spherical, parabolic or elliptical.

10. The apparatus of claim 9 , wherein the at least one reflector has a surface roughness greater than 20 Å RMS, 40 Å RMS, 80 Å RMS, 100 Å RMS, 150 Å RMS, 200 Å RMS, 250 Å RMS, 500 Å RMS, or 1000 Å RMS over at least a surface area of 10 μm by 10 μm.

11. The apparatus of claim 1 , wherein the at least one reflector has a surface figure greater than, in at least one area, λ/100, λ/50, λ/10, λ/5, λ/2, λ, 2λ, 3λ, 5λ, or 10λ, where λ is a wavelength of light in the beam emitted from the light source.

12. The apparatus of claim 1 , wherein the one or more reflective surfaces cause a loss of intensity of the beam from the light source to the at least one detector.

13. The apparatus of claim 12 , wherein the one or more reflective surfaces randomly diffract the beam from the light source.

14. The apparatus of claim 12 , wherein the one or more reflective surfaces diffract the beam from the light source in a predetermined pattern.

15. The apparatus of claim 1 , wherein the one or more reflective surfaces cause scattering, diffractive, or both scattering and diffractive signal losses such that an intensity of the beam detected by the at least one detector is below a predefined percentage of an intensity of the beam as emitted by the light source, and wherein the beam of light includes a modulation frequency and the apparatus further includes a controller configured to determine a concentration of an analyte using wavelength modulation spectroscopy, the determining comprising processing intensity data from the at least one detector to demodulate the intensity data.

16. The apparatus of claim 1 , wherein the one or more reflective surfaces comprise at least one of single point diamond turned mirrors, molded surfaces, wet etched surfaces, dry etched surfaces, pressed mirrors, sintered mirrors, or formed surfaces.

17. The apparatus of claim 16 , wherein the one or more reflective surfaces comprise at least one of a: machined metal, etched metal, molded metal, cast metal, formed metal, a dielectric coated metal, a semiconductor-coated metal, machined plastic, etched plastic, molded plastic, cast plastic, plastic films, metal-coated plastic, dielectric-coated plastic, semiconductor-coated plastic, a composite material, metal-coated composite material, dielectric-coated composite material, semiconductor-coated composite material, a machined ceramic material, a molded ceramic material, a cast ceramic material, a pressed and sintered ceramic material, a metal coated ceramic material, a dielectric coated ceramic material, a semiconductor coated dielectric material, a machined glass material, an etched glass material, a molded glass material, a cast glass material, a metal coated glass, a dielectric coated glass material, a semiconductor coated glass material, a dielectric material, a semiconductor, a machined semiconductor, an etched semiconductor, a metal coated semiconductor, or a dielectric coated semiconductor.

18. The apparatus of claim 17 , wherein the one or more reflective surfaces comprise a plastic material coated with a metal or a dielectric or a semiconductor.

19. The apparatus of claim 17 , wherein the one or more reflective surfaces comprise a ceramic material coated with a metal or a dielectric or a semiconductor.

20. The apparatus of claim 17 , wherein the one or more reflective surfaces comprise a semiconductor coated with a metal or a dielectric.

21. The apparatus of claim 1 further comprising:

at least one aperture included along the beam path between the light source and the at least one detector.

22. A method comprising:

emitting, by a light source forming part of a spectrometer, a beam along a beam path into a sample volume comprising an analyte;

detecting, by at least one detector, at least a portion of the beam emitted by the light source after the beam has been reflected by at least one reflector, the at least one reflector being positioned along the beam path intermediate the light source and the at least one detector and has a surface roughness greater than about 20 Å RMS and less than a maximum surface roughness that prevents detection of a total power of the beam and a higher order harmonic signal of the beam by the at least one detector, the detecting of the at least a portion of the beam comprising quantifying the total power and the higher order harmonic signal impinging on the at least one detector; and

calculating a concentration of the analyte in the sample volume based on a ratio determined using the total power and the higher order signal impinging on the at least one detector.

23. The method of claim 22 , wherein the at least one reflector is integral to a housing of a sample cell of a spectrometer that also comprises the light source and detector.

24. The method of claim 22 , wherein the at least one reflector is coupled to a housing of a sample cell of a spectrometer that also comprises the light source and detector.

25. The method of claim 22 , wherein the at least one reflector has a radius of curvature varying from a predetermined radius of curvature by more than ±0.05%, ±0.075%, ±0.1%, ±0.15%, ±0.22%, ±0.5%, ±1%, ±1.5%, or ±2%.

26. The method of claim 22 , wherein the predetermined radius of curvature is based on a spacing and position of the at least one reflector in relation to the at least one light source and/or at least one detector.

27. The method of claim 22 , wherein the at least one reflector has a radius of curvature that is infinite or substantially infinite.

28. The method of claim 22 , wherein at least a portion of the at least one reflector has a negative radius of curvature.

29. The method of claim 22 , wherein at least a portion of the at least one reflector has a positive radius of curvature.

30. The method of claim 22 , wherein at least a portion of the at least one reflector is cylindrical, aspheric, toroidal, spherical, parabolic or elliptical.

31. The method of claim 30 , wherein the at least one reflector has a surface roughness greater than 20 Å RMS, 40 Å RMS, 80 Å RMS, 100 Å RMS, 150 Å RMS, 200 Å RMS, 250 Å RMS, 500 Å RMS, or 1000 Å RMS over at least a surface area of 10 μm by 10 μm.

32. The method of claim 22 , wherein the at least one reflector has a surface figure greater than, in at least one area, λ/100, λ/50, λ/10, λ/5, λ/2, λ, 2λ, 3λ, 5λ, or 10λ, where λ is a wavelength of light in the beam emitted from the light source.

33. The method of claim 22 , wherein the one or more reflective surfaces cause a loss of intensity of the beam from the light source to the at least one detector.

34. The method of claim 33 , wherein the one or more reflective surfaces randomly diffract the beam from the light source.

35. The method of claim 34 , wherein the one or more reflective surfaces diffract the beam from the light source in a predetermined pattern.

36. The method of claim 22 , wherein the one or more reflective surfaces cause scattering, diffractive, or both scattering and diffractive signal losses such that an intensity of the beam detected by the at least one detector is below a predefined percentage of an intensity of the beam as emitted by the light source, wherein the method further comprises:

controlling the light source to emit the beam of light with a modulation frequency; and

determining a concentration of an analyte using wavelength modulation spectroscopy, the determining comprising processing intensity data from the at least one detector to demodulate the intensity data.

37. The method of claim 22 , wherein the one or more reflective surfaces comprise at least one of single point diamond turned mirrors, molded surfaces, wet etched surfaces, dry etched surfaces, pressed mirrors, sintered mirrors, or formed surfaces.

38. The method of claim 37 , wherein the one or more reflective surfaces comprise at least one of a: machined metal, etched metal, molded metal, cast metal, formed metal, a dielectric coated metal, a semiconductor-coated metal, machined plastic, etched plastic, molded plastic, cast plastic, plastic films, metal-coated plastic, dielectric-coated plastic, semiconductor-coated plastic, a composite material, metal-coated composite material, dielectric-coated composite material, semiconductor-coated composite material, a machined ceramic material, a molded ceramic material, a cast ceramic material, a pressed and sintered ceramic material, a metal coated ceramic material, a dielectric coated ceramic material, a semiconductor coated dielectric material, a machined glass material, an etched glass material, a molded glass material, a cast glass material, a metal coated glass, a dielectric coated glass material, a semiconductor coated glass material, a dielectric material, a semiconductor, a machined semiconductor, an etched semiconductor, a metal coated semiconductor, or a dielectric coated semiconductor.

39. The method of claim 38 , wherein the one or more reflective surfaces comprise a plastic material coated with a metal or a dielectric or a semiconductor.

40. The method of claim 39 , wherein the one or more reflective surfaces comprise a ceramic material coated with a metal or a dielectric or a semiconductor.

41. The method of claim 39 , wherein the one or more reflective surfaces comprise a semiconductor coated with a metal or a dielectric.

42. The method of claim 22 , wherein the spectrometer further comprises:

at least one aperture included along the beam path between the light source and the at least one detector.

43. An apparatus comprising:

a light source configured to emit a beam along a beam path through a sample volume comprising an analyte;

at least one detector positioned to detect at least a portion of the beam emitted by the light source;

rough reflector means positioned along the beam path intermediate the light source and the at least one detector having a surface roughness greater than a predefined amount, the surface roughness of the rough reflector means being sufficient to cause scattering, diffractive, or both scattering and diffractive signal losses such that an intensity of the beam detected by the at least one detector is below a predefined percentage of an intensity of the beam as emitted by the light source, the predefined percentage being below approximately 10% of an original beam intensity; and

a controller configured to perform operations comprising:

controlling the light source to emit the beam of light with a modulation frequency,

processing intensity data from the at least one detector to demodulate the intensity data, and

calculating a concentration of the analyte in the sample volume using wavelength modulation spectroscopy based on a ratio using a total power of the beam and a higher order harmonic signal of the beam impinging on the at least one detector.