IP Library Granted Patent US 9,681,515
Granted Patent B2
US 9,681,515 · App. 14/710,627 · Granted Jun 13, 2017

LED structure with a dynamic spectrum and a method

Inventor: Juha Rantala (Bäch, CH)
H05B33/0857A01G7/045A01G9/20H01L25/0753H01L33/504H01L2933/0041
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Quick Facts
Patent No.
US 9,681,515
App. No.
14/710,627
Granted
Jun 13, 2017
Kind
B2
Abstract

An integrated LED structure and a method of adjusting the emission spectrum of an integrated LED structure, for photobiological process. The structure comprises a substrate; a plurality of optically isolated and electrically non-independent light emission areas integrated on the substrate; a light emitting semiconductor source of a first type mounted in the emission area(s); a light emitting semiconductor source of a second type mounted in the emission area(s); an electrical circuit layer for connecting the said light emitting semiconductor sources in serial fashion for each emission area; and wavelength conversion materials. The emission areas are controlled with a common electrical drive current, and the emission output can be tuned by adjusting the common current value, to enable use of one luminaire for a large variety of biomass growing applications.

Claims (19)

1. A method of adjusting the emission spectrum of an integrated LED structure for photobiological process, comprising:

generating the emission output by supplying a common current to the semiconductor light emitting sources in the LED structure;

tuning the emission spectrum's multiple intensity peaks to a nominal operating point by adjusting the common current value to a mid-value range; and

tuning the emission spectrum's multiple peaks' intensity ratios within the full range by adjusting the common current from a minimum value to a maximum value.

2. The method of claim 1 , further comprising tuning the common current to a low value within the operating range of said integrated LED structure in order to achieve an emission spectrum with equal intensity between 620 and 640 nm and between 650 and 670 nm.

3. The method of claim 1 , further comprising tuning the common current to a high value within the operating range of said integrated LED structure in order to achieve an emission spectrum with high intensity between 620 and 640 nm and low intensity between 650 and 670 nm.

4. The method of claim 1 , further comprising tuning the common current to a low value within the operating range of said integrated LED structure in order to achieve an emission spectrum with low intensity between 620 and 640 nm and high intensity between 650 and 670 nm.

5. The method according to claim 2 , wherein the low value of the common current is at least 20% lower than the mid value of the common current in the range from said minimum value to said maximum value.

6. The method according to claim 3 , wherein the high value of the common current is at least 20% higher than the mid value of the common current in the range from said minimum value to said maximum value.

7. The method according to claim 1 , wherein the intensity ratio between a peak in the range of 620 to 640 nm and a corresponding peak in the range from 650 to 670 nm is in the range from 0.8:1 to 3:1.

8. The method according to claim 7 , wherein the intensity ratio between said peaks is in the range from 0.5 to 1.1:1 as a low value of intensity and in the range from 1.2 to 3:1 at a high value of intensity.

9. The method according to claim 1 , wherein the LED structure comprises:

a substrate;

a plurality of optically isolated and electrically connected light emission areas integrated on the substrate;

a light emitting semiconductor source of a first type mounted in the emission area(s);

a light emitting semiconductor source of a second type mounted in the emission area(s);

an electrical circuit layer for connecting the said light emitting semiconductor sources in serial fashion for each emission area;

a wavelength conversion material of the first type formed on the top of the said first type of light emitting semiconductor sources; and

a wavelength conversion material of the second type formed on the top of the said second type of light emitting semiconductor sources.

Assignments (7)
SECURITY INTEREST Recorded Mar 28, 2024
From: ILLUMIPURE, INC.
To: ELAF INVESTMENTS 2 LTD
Reel/Frame 066938/0363 →
CHANGE OF NAME Recorded Mar 28, 2024
From: CALYXPURE, INC.
To: ILLUMIPURE INC.
Reel/Frame 066928/0570 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 22, 2022
From: RANTALA, JUHA; ILLUMIPURE CORP; CALYX CULTIVATION TECH. CORP.
To: CALYXPURE, INC.
Reel/Frame 060592/0954 →
MERGER AND CHANGE OF NAME Recorded Feb 23, 2022
From: ILLUMIPURE CORP; CALYX CULTIVATION TECH. CORP.; CALYX CULTIVATION TECH. CORP.
To: CALYXPURE, INC.
Reel/Frame 059074/0167 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 8, 2019
From: RANTALA, JUHA
To: ILLUMIPURE CORP
Reel/Frame 048032/0202 →
RELEASE OF SECURITY INTEREST Recorded Jun 1, 2017
From: SURNA, INC.
To: LUMICHIP LIMITED
Reel/Frame 042662/0605 →
SECURITY INTEREST Recorded Nov 10, 2016
From: LUMICHIP LIMITED
To: SURNA, INC.
Reel/Frame 040586/0414 →
Continuity (1)
Related Publication 20160338168A1 · Nov 17, 2016