Method of manufacturing a semiconductor device including removing a relief layer from back surface of semiconductor chip

1. A method of manufacturing a device, the method comprising:

providing a first semiconductor chip having a first face and a second face opposite to the first face, wherein a contact pad is arranged on the first face;

placing the first semiconductor chip on a carrier;

after placing the first semiconductor chip on the carrier, encapsulating the first semiconductor chip with an encapsulation material to create an encapsulation body, such that the second face is covered by the encapsulation material;

removing the carrier; and

after removing the carrier, removing semiconductor material from the second face to create a new second face and removing encapsulation material from the encapsulation body to create a planar back surface of the encapsulation body that includes the new second face and a top face of the encapsulation material surrounding the second face;

removing an entire top layer of semiconductor material from the new second face to create a final second face that has an outer edge region, wherein an entirety of the final second face, including the outer edge region, is recessed with respect to the top face of the encapsulation material.

2. The method of claim 1 , wherein removing the semiconductor material and encapsulation material comprises grinding the encapsulation body.

3. The method of claim 2 , wherein the removing the top layer of the semiconductor material from the second face comprises grinding the encapsulation body a second time after forming the redistribution layer on a front surface of the encapsulation body that includes the first face of the first semiconductor chip.

4. The method of claim 1 , further comprising: forming a redistribution layer on the first face of the first semiconductor chip.

5. The method of claim 4 , wherein the redistribution layer extends beyond an outline of the first semiconductor chip.

6. The method of claim 4 , wherein forming the redistribution layer comprises galvanically depositing a metal layer on the first face of the first semiconductor chip and the encapsulation material.

7. The method of claim 1 , further comprising: placing a second semiconductor chip on the carrier; and encapsulating the second semiconductor chip with the encapsulation material.

8. The method of claim 7 , further comprising: dicing the encapsulation material, thereby separating the first semiconductor chip from the second semiconductor chip.

9. The method of claim 1 , wherein the final second face is recessed by 3 to 10 μm with respect to the top face of the encapsulation body.

10. The method of claim 1 , wherein there is a gap between the final second face and the top surface of the encapsulation material surrounding the final second face having a height in the range from 3 to 10 μm.

11. The method of claim 1 , wherein the first semiconductor chip has a first face and a second face opposite to the first face, wherein a contact element protrudes by at least 1 μm from the first face, placing the first semiconductor chip on the carrier comprises placing the first semiconductor chip on the carrier with the second face of the first semiconductor chip facing the carrier, and removing semiconductor material from the first semiconductor chip comprises removing semiconductor material from the second face of the first semiconductor chip.

12. The method of claim 1 , wherein the final second face is planar.