Nanostructured solar cell
View Patent ↗Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
1. A method of producing a solar cell, the method comprising:
providing a substrate;
forming a patterned layer in direct contact with the substrate, the patterned layer including:
i) a repeating pattern of pyramid nanostructures extending away from the substrate such that there is a distance between bases of directly adjacent pyramid nanostructures. and
ii) a residual layer positioned between the pyramid nanostructures and the substrate, wherein the intersections between a surface of the residual layer and the bases of the pyramid nanostructures are rounded;
depositing a first conducting material in direct contact with the patterned layer and coinciding with the repeating pattern of the pyramid nanostructures;
depositing a semiconductor layer on the first conducting material, the semiconductor layer comprising, in an order of deposition, an amorphous silicon p-type layer, an amorphous silicon intrinsic layer, and an amorphous silicon n-type layer; and
depositing a second conducting material in direct contact with the semiconductor layer, wherein the semiconductor layer and the second conducting material coincide with the repeating pattern of the pyramid nanostructures.
2. The method of claim 1 , wherein an aspect ratio of the pyramid nanostructures is between 0.5 and 10.
3. The method of claim 1 , wherein forming the patterned layer further includes forming the pyramid nanostructures to have a height between 100 nm and 2 μm and a pitch between 300 nm and 2 μm.
4. The method of claim 1 , wherein forming the patterned layer further includes forming the pyramid nanostructures such that an angle between the surface and faces of the pyramid nanostructures is between 110° and 150°.
5. The method of claim 1 , wherein forming the patterned layer further includes forming the pyramid nanostructures such that the distance between bases of the pyramid nanostructures is between greater than 0 and 500 nm.
6. The method of claim 1 , further comprising forming a buffer layer between the first conducting material and the semiconductor layer.
7. The method of claim 1 , further comprising roughening surfaces of the pyramid nanostructures.
8. The method of claim 1 , wherein the residual layer has a thickness of less than 25 nm.
9. The method of claim 1 , further comprising removing the residual layer.
10. The method of claim 9 , wherein the residual layer is removed by VUV etching.
11. The method of claim 1 , further comprising transferring the patterned layer to the substrate by wet etching.
12. The method of claim 11 , wherein the wet etching increases a feature height and aspect ratio of the pyramid nanostructures.
13. The method of claim 1 , wherein forming the patterned layer is a polymeric layer containing the repeating pattern of pyramid nano structures.
14. The method of claim 13 , wherein the polymeric layer contains silicon, the method further comprising oxidizing a surface of the silicon-containing polymeric layer to form a glass top surface layer.