Cooling plasma cutting system consumables and related systems and methods
View Patent ↗In some aspects, electrodes can include a front portion shaped to matingly engage a nozzle of the plasma cutting system, the front portion having a first end comprising a plasma arc emitter disposed therein; and a rear portion thermally connected to a second end of the front portion, the rear portion shaped to slidingly engage with a complementary swirl ring of the plasma cutting system and including: an annular mating feature extending radially from a proximal end of the rear portion of the electrode to define a first annular width to interface with the swirl ring, the annular mating feature comprising a sealing member configured to form a dynamic seal with the swirl ring to inhibit a flow of a gas from a forward side of the annular mating feature to a rearward side of the annular mating feature.
1. An electrode for a plasma cutting system, the electrode comprising:
an arc portion shaped to matingly engage a nozzle of the plasma cutting system, the arc portion having a first end comprising a plasma arc emitter disposed at a distal end thereof; and
a thermal portion in thermal communication with a second end of the arc portion, the thermal portion shaped to slidingly engage a complementary swirl ring of the plasma cutting system and including:
a first circumferentially formed disk-shaped flange mating feature extending radially from a proximal end of the thermal portion of the electrode, the first circumferentially formed disk shaped flange mating feature defining a first radial width to physically mate with the swirl ring, the first circumferentially formed disk-shaped flange mating feature including a sealing member adapted to form a dynamic seal with the swirl ring to prevent a gas from traveling proximally between the electrode and the swirl ring,
a second circumferentially formed disk-shaped flange mating feature extending radially from a distal end of the thermal portion of the electrode to define a second radial width to physically mate with the swirl ring, wherein the first radial width and the second radial width are substantially equal, and
a thermal exchange surface region between the first disk-shaped flange mating feature and the second disk-shaped flange mating feature, the thermal exchange surface defining at least one annular flange extending from the thermal portion between the first circumferentially formed disk-shaped flange mating feature and the second circumferentially formed disk-shaped flange mating feature, the at least one annular flange having a radial width less than at least one of the first radial width and the second radial width.
2. The electrode of claim 1 wherein the radial width of the at least one annular flange is about 50% to about 85% less than the first radial width.
3. The electrode of claim 1 wherein the at least one annular flange has an axial thickness that is about 5% to about 25% of an axial length of the thermal exchange surface region.
4. The electrode of claim 1 wherein the at least one annular flange comprises at least two annular flanges that are spaced apart by a spacing that is about 5% to about 25% of an axial thickness of one of the at least two annular flanges.
5. The electrode of claim 4 wherein at least one of the at least two annular flanges comprise the first circumferentially formed disk-shaped flange mating feature or the second circumferentially formed disk-shaped flange mating feature.
6. The electrode of claim 1 wherein the at least one annular flange comprises three annular flanges arranged between the first circumferentially formed disk-shaped flange mating feature and the second circumferentially formed disk-shaped flange mating feature.
7. The electrode of claim 1 wherein the at least one annular flange comprises a sharp corner edge around its outer surface.
8. The electrode of claim 1 wherein the first circumferentially formed disk-shaped flange mating feature, the second circumferentially formed disk-shaped flange mating feature, and the thermal exchange surface region partially define a cooling cavity.
9. The electrode of claim 1 wherein at least one of the first disk-shaped flange mating feature or the second disk-shaped flange mating feature comprises a continuous circumferentially formed flange.
10. The electrode of claim 1 wherein the electrode forms a thermally conductive path between the thermal exchange surface of the thermal portion and the plasma arc emitter of the arc portion.
11. The electrode of claim 10 wherein a gas flow passing between the first circumferentially formed disk-shaped flange mating feature and the second circumferentially formed disk-shaped flange mating feature convectively cools the thermal exchange surface region and the thermal portion conductively cools the arc portion.