Polishing pad dresser, polishing apparatus and polishing pad dressing method
View Patent ↗In one embodiment, a polishing pad dresser includes a first base portion, and first convex portions provided in a first region of the first base portion. Furthermore, a width of the first convex portions is 1 to 10 μm, a height of the first convex portions is 0.5 to 10 μm, and a density of the first convex portions in the first region is 0.1 to 50%.
1. A polishing pad dresser comprising:
a first base portion;
first convex portions provided in a first region of the first base portion;
a second base portion adjacent to the first base portion; and
second convex portions provided in a second region of the second base portion,
wherein
a width of the first convex portions is 1 to 10 μm,
a height of the first convex portions is 0.5 to 10 μm,
a density of the first convex portions in the first region is 0.1 to 50%,
a width of the second convex portions is greater than 10 μm, and
a height of the second convex portions is greater than 10 μm.
2. The dresser of claim 1 , wherein the first base portion is configured to be movable relative to the second base portion.
3. The dresser of claim 1 , wherein one of the first and second base portions annularly surrounds the other of the first and second base portion.
4. The dresser of claim 1 , wherein the second convex portions are formed of diamond.
5. The dresser of claim 1 , wherein the first convex portions are formed of a same material as at least a portion of the first base portion.
6. The dresser of claim 1 , wherein the first convex portions contain silicon, titanium or aluminum.
7. The dresser of claim 6 , wherein the first convex portions are oxide, nitride or carbide containing silicon, titanium or aluminum.
8. The dresser of claim 1 , wherein
the first and second base portions are configured such that one of the first and second base portions vertically moves relative to the other of the first and second base portions,
a lower face of the first convex portions is placed lower than a lower face of the second convex portions when the first base portion moves lower than the second base portion, and
the lower face of the second convex portions is placed lower than the lower face of the first convex portions when the second base portion moves lower than the first base portion.
9. A polishing apparatus comprising:
a polishing pad configured to polish a substrate;
a polishing head configured to hold the substrate to bring the substrate into contact with the polishing pad; and
a polishing pad dresser including a first base portion, first convex portions provided in a first region of the first base portion, a second base portion adjacent to the first base portion, and second convex portions provided in a second region of the second base portion, and configured to dress the polishing pad with the first and second convex portions,
wherein
a width of the first convex portions is 1 to 10 μm,
a height of the first convex portions is 0.5 to 10 μm,
a density of the first convex portions in the first region is 0.1 to 50%,
a width of the second convex portions is greater than 10 μm, and
a height of the second convex portions is greater than 10 μm.
10. The apparatus of claim 9 , wherein the first base portion is configured to be movable relative to the second base portion.
11. The apparatus of claim 9 , wherein one of the first and second base portions annularly surrounds the other of the first and second base portion.
12. The apparatus of claim 9 , wherein the second convex portions are formed of diamond.
13. The apparatus of claim 9 , wherein the first convex portions are formed of a same material as at least a portion of the first base portion.
14. The apparatus of claim 9 , wherein the first convex portions contain silicon, titanium or aluminum.
15. The apparatus of claim 14 , wherein the first convex portions are oxide, nitride or carbide containing silicon, titanium or aluminum.
16. The apparatus of claim 9 , wherein
the first and second base portions are configured such that one of the first and second base portions vertically moves relative to the other of the first and second base portions,
a lower face of the first convex portions is placed lower than a lower face of the second convex portions when the first base portion moves lower than the second base portion, and
the lower face of the second convex portions is placed lower than the lower face of the first convex portions when the second base portion moves lower than the first base portion.
17. A polishing Dad dressing method comprising:
preparing a polishing pad dresser including a first base portion, first convex portions provided in a first region of the first base portion, a second base portion adjacent to the first base portion, and second convex portions provided in a second region of the second base portion, a width of the first convex portions being 1 to 10 μm, a height of the first convex portions being 0.5 to 10 μm, a density of the first convex portions in the first region being 0.1 to 50%, a width of the second convex portions being greater than 10 μm, and a height of the second convex portions being greater than 10 μm, and
dressing the polishing pad with the first and second convex portions of the polishing pad dresser.
18. The method of claim 17 , wherein the first convex portions of the polishing pad dresser are formed by etching a material of the first convex portions.
19. The method of claim 17 , wherein the first convex portions of the polishing pad dresser are formed by metallic molding.
20. The method of claim 17 , wherein
the first and second base portions are configured such that one of the first and second base portions vertically moves relative to the other of the first and second base portions,
a lower face of the first convex portions is placed lower than a lower face of the second convex portions when the first base portion moves lower than the second base portion, and
the lower face of the second convex portions is placed lower than the lower face of the first convex portions when the second base portion moves lower than the first base portion.