Hardening chromium oxide films in a magnetic tape head and other structures
A chromium oxide film is formed at room temperature. The chromium oxide film has at least one partially polycrystalline portion and/or at least one amorphous portion depending upon the substrate(s) over which the chromium oxide film is formed. Partially polycrystalline portion(s) of the chromium oxide film are exposed, at room temperature, to an electron beam that has an accelerating voltage of at least 100 kilovolts to further crystallize the partially polycrystalline portion(s). Amorphous portion(s) of the chromium oxide film are exposed, at room temperature, to an electron beam that has an accelerating voltage of more than 100 kilovolts to crystallize the amorphous portion(s).
1. A method, comprising:
depositing a plurality of layers to form, at least in part, a tape head, wherein:
a chromium oxide component is a chromium oxide layer that is included in the plurality of layers;
the plurality of layers includes at least one nickel-iron shield formed therein;
the plurality of layers includes at least one transducer formed therein; and
the at least one transducer includes at least one of a sensor and a writer;
depositing the chromium oxide layer onto the nickel-iron shield, wherein the deposited oxide layer is partially polycrystalline; and
exposing a media facing side of the chromium oxide component to an electron beam having an accelerating voltage of at least 100 kilovolts to crystallize at least a portion of the chromium oxide component.
2. The method of claim 1 , wherein exposing the chromium oxide component to the electron beam increases the hardness of the chromium oxide component to at least 12 gigapascals.
3. The method of claim 1 , wherein exposing the chromium oxide component to the electron beam increases the hardness of the chromium oxide component by at least twenty percent.
4. The method of claim 1 , wherein the chromium oxide layer is positioned between the transducer and the nickel-iron shield.
5. The method of claim 1 , further comprising:
depositing a chromium oxide overcoat on a media facing side of the plurality of layers that form, at least in part, the tape head; and
exposing at least a portion of the overcoat to the electron beam to further crystallize, at least in part, a partially polycrystalline portion of the overcoat.
6. The method of claim 1 , further comprising:
depositing a chromium oxide overcoat on a media facing side of the plurality of layers that form, at least in part, the tape head; and
exposing at least a portion of the overcoat to electron beam to crystallize, at least in part, an amorphous portion of the overcoat, wherein the electron beam has an accelerating voltage of more than 100 kilovolts.
7. The method of claim 6 , further comprising:
crystallizing at least one layer of the plurality of layers to a depth below the overcoat.
8. The method of claim 1 , wherein the electron beam has an accelerating voltage of more than 100 kilovolts to crystallize, at least in part, an amorphous portion of the chromium oxide component.
9. The method of claim 1 , wherein the electron beam is rastered across the media facing side of the chromium oxide component.