Solution composition and method for single-bath post treatment of substrate
Disclosed is a solution composition which may be used for a single-bath electrochemical passivation and a method using the same. The solution composition includes a metal cation, a metal-oxide anion; and an organic ligand, and optionally includes a non-metallic oxide anion or a polymer. The solution composition may prevent undesired precipitation of metal oxides before performing passivation. In addition, the method of passivation using the solution composition in a single-bath use is also provided.
1. A method of single-bath passivation post-treatment, comprising:
preparing a solution composition;
applying the solution composition to a substrate;
applying an electric current to the substrate to perform an electrode deposition;
wherein the solution composition comprises: a metal cation; a metal-oxide anion; an organic ligand; a non-metallic oxide anion; and a polymer and further wherein the metal cation is Ce 3+ , Y 3+ , La 3+ , Pr 3+ , Sm 3+ , or mixtures thereof; the metal-oxide anion is VO 3 − , MoO 4 2− , WO 4 2− or mixtures thereof; the organic ligand is acetic acid, lactic acid, citric acid, oxalic acid, salicylic acid, tartaric acid, ethylenediaminetetraacetic acid (EDTA) and mixtures thereof; the non-metallic oxide anion is PO 4 3− , SiO 3 − , B 2 O 4 2− and mixtures thereof; and the polymer is polyacrylic acid, polyol, polyethylene glycol, or mixtures thereof.
2. The method of claim 1 , wherein the electric current applied to the substrate is a forward pulse electric current or a reverse pulse electric current.
3. The method of claim 1 , further comprising, applying a secondary electric current to the substrate in the solution composition to perform a second electrode deposition.
4. The method of claim 1 , wherein a cycle for when the electric current is applied to the substrate comprises about 100 ms of t c , about 20 ms of t a , and about 40 ms of t off as one cycle time.
5. The method of claim 1 , wherein the electric current applied to substrate is in a range of about 0.06 to 1.0 mA/cm 2 .
6. The method of claim 1 , wherein pH of the solution composition is in a range of about pH 7.0 to about pH 11.0.
7. The method of claim 1 , wherein a temperature of the solution composition is in a range of about 25 to 50° C.
8. The method of claim 1 , wherein the solution composition is aerated with air or oxygen gas (O 2 ) during the electrode deposition.