Laser patterning of multi-layer structures
View Patent ↗A method of non-ablatively laser patterning a multi-layer structure, the multi-layer structure including a substrate, a first layer disposed on the substrate, a second layer disposed on the first layer, and a third layer disposed on the second layer, the method including generating at least one laser pulse having laser parameters selected for non-ablatively changing the conductivity a selected portion of the third layer such that the selected portion becomes non-conductive, and directing the pulse to the multi-layer structure, wherein the conductivity of the first layer is not substantially changed by the pulse.
1. A method of laser patterning a multi-layer structure, comprising:
providing a multi-layer structure comprising a substrate, a first layer disposed on the substrate, a second layer disposed on the first layer, and a third layer that includes silver nanowires and that is disposed on the second layer;
generating at least one laser pulse having laser parameters selected for non-ablatively changing the conductivity of a selected portion of the silver nanowires of the third layer such that the selected portion of the silver nanowires remains intact and becomes non-conductive; and
directing the pulse to the multi-layer structure;
wherein the conductive state of the first layer remains unchanged by the pulse.
2. The method of claim 1 , wherein the first layer includes silver nanowires.
3. The method of claim 1 , wherein the first layer includes indium tin oxide.
4. The method of claim 1 , wherein the second layer is a photoresist with insulation properties.
5. The method of claim 1 , wherein the second layer is situated to protect the first layer from conductivity altering characteristics of the pulse.
6. The method of claim 5 , wherein the second layer is situated to scatter or absorb energy from the pulse.
7. The method of claim 1 , wherein the first layer has a higher laser pulse conductivity alteration threshold than the third layer.
8. The method of claim 1 , further comprising heat treating the first layer so as to increase a laser pulse conductivity altering threshold.
9. A method of forming a multi-layer stack-up structure, comprising:
providing a substrate;
depositing a conductive first layer on the substrate;
laser patterning the first layer such that selected portions of the first layer become non-conductive;
depositing an insulating second layer on the first layer;
depositing on the second layer a conductive third layer of silver nanowires; and
non-ablatively laser patterning the third layer such that selected portions of the silver nanowires of the third layer remain intact and become non-conductive without changing the conductive state of the first layer.
10. The method of claim 9 , wherein the first layer includes silver nanowires.
11. The method of claim 9 , wherein the first layer includes indium tin oxide.
12. The method of claim 9 , wherein the second layer is photoresist and has electrical insulation properties.
13. The method of claim 9 , wherein the second layer is situated to protect the first layer from changing conductivity during the non-ablative laser patterning of the third layer.
14. The method of claim 13 , wherein the second layer is situated to scatter or absorb energy during the non-ablative laser patterning of the third layer.
15. The method of claim 9 , wherein the first layer has a higher laser pulse conductivity alteration threshold than the third layer.
16. The method of claim 9 , further comprising heat treating the first layer after the first layer has been laser patterned.
17. The method of claim 9 , wherein the laser patterning of the first layer is non-ablative.