Interbody implants and graft delivery systems
According to some embodiments, a method for promoting spinal fusion using a spinal implant comprises providing a spinal implant, wherein the spinal implant comprises at least one internal chamber being is adapted to receive at least one graft and/or other fill material. In some arrangements, one or more walls of the spinal implant comprise at least one opening or hole that places the internal chamber in fluid communication with an exterior area or portion of the spinal implant. The method additionally includes positioning the spinal implant between two adjacent vertebrae of a patient and directing at least one graft and/or other fill material into the internal chamber of the spinal implant through the access port.
1. A spinal implant configured for placement within an intervertebral space of a subject, comprising:
a distal end and a proximal end, wherein the implant comprises a longitudinal axis that extends from the distal end or the proximal end;
a first sidewall and a second sidewall extending at least partially from the proximal end to the distal end of the implant, wherein each of the first and second sidewalls are parallel with the longitudinal axis of the implant, wherein the first sidewall and the second sidewall at least partially define at least interior chamber of the implant;
an inlet opening configured to permit graft material to be selectively delivered into the at least one interior chamber of the implant after implantation of the implant into a subject;
at least one first sidewall opening located along the first sidewall, wherein the at least one first sidewall opening is configured to extend through the first sidewall; and
at least one second sidewall opening located along the second sidewall, wherein the at least one second sidewall opening is configured to extend through the second sidewall;
wherein the at least one interior chamber is in fluid communication with the inlet, the at least one first sidewall opening and the at least one second sidewall opening;
wherein the at least one first sidewall opening and the at least one second sidewall opening are configured to allow a greater volume of a graft material delivered into the at least one interior chamber to exit through the at least one first sidewall opening relative to the at least one second sidewall opening;
wherein each of the at least one first sidewall opening and the at least one second sidewall opening is angled relative to the longitudinal axis of the implant by an angle θ, wherein θ is at least one of: (a) 0 to 45 degrees, and (b) greater than 45 degrees;
wherein both the at least one first sidewall opening and the at least one second sidewall opening are maintained within the distal half of the implant such that graft material exits the at least one interior chamber only through openings along the distal half of the implant; and
wherein an orientation and configuration of the at least one first sidewall opening and the at least one sidewall opening help create a desired flow pattern for graft material exiting the at least one interior chamber of the implant.
2. The implant of claim 1 , wherein the implant comprises a transforaminal lumbar interbody fusion (TLIF) implant.
3. The implant of claim 2 , wherein the implant comprises an oblique TLIF implant.
4. The implant of claim 1 , wherein the implant comprises a lateral interbody fusion implant.
5. The implant of claim 1 , wherein the implant comprises a posterior lumbar interbody fusion (PLIF) implant.
6. The implant of claim 1 , wherein the implant comprises an anterior lumbar interbody fusion (ALIF) implant.
7. The implant of claim 1 , wherein the longitudinal axis of the implant is straight or generally straight.
8. The implant of claim 1 , wherein the longitudinal axis of the implant is non-linear.
9. The implant of claim 8 , wherein the longitudinal axis of the implant comprises a curve.
10. The implant of claim 8 , wherein the longitudinal axis of the implant comprises a banana-shape.
11. The implant of claim 1 , wherein θ is 10 to 45 degrees.
12. The implant of claim 1 , wherein θ is greater than 45 degrees.
13. The implant of claim 1 , wherein θ is less than 10 degrees.
14. The implant of claim 1 , wherein a total cross-sectional area of the at least one first sidewall opening is greater than a total cross-sectional area of the at least one second sidewall opening.
15. The implant of claim 14 , wherein a total cross-sectional area of the at least one first sidewall opening is greater than a total cross-sectional area of the at least one second sidewall opening by up to 40%.