IP Library Granted Patent US 9,791,306
Granted Patent B2
US 9,791,306 · App. 14/778,278 · Granted Oct 17, 2017

Thermal type flowmeter

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Quick Facts
Patent No.
US 9,791,306
App. No.
14/778,278
Granted
Oct 17, 2017
Kind
B2
Abstract

In order to provide a method of manufacturing a thermal type flowmeter that is capable of reducing deformation of a semiconductor chip, which is caused by molding, a method of manufacturing a thermal type flowmeter is provided that includes a circuit package of a resin-molded semiconductor chip. The method includes resin-molding the semiconductor chip in a state in which a mold is pressed against a heat transfer surface that is provided on a surface of the semiconductor chip and a pressed surface that is set on the surface of the semiconductor chip at a position separate from the heat transfer surface.

Claims (22)

1. A method of manufacturing a thermal type flowmeter that includes a circuit package of a resin-molded semiconductor chip, the method comprising:

resin-molding a semiconductor chip in a state in which a mold is pressed against a heat transfer surface that is provided on a surface of the semiconductor chip and a pressed surface that is set on the surface of the semiconductor chip at a position separate from the heat transfer surface.

2. The method of manufacturing a thermal type flowmeter according to claim 1 ,

wherein the pressed surface is set at a position between an edge that is located at the furthest position from the heat transfer surface of the semiconductor chip and the heat transfer surface.

3. The method of manufacturing a thermal type flowmeter according to claim 1 ,

wherein the heat transfer surface continues to the pressed surface.

4. The method of manufacturing a thermal type flowmeter according to claim 1 ,

wherein a substrate to which the semiconductor chip is mounted is provided; and

wherein the semiconductor chip is configured such that a back surface of the semiconductor chip is fixed to the substrate with an adhesive interposed between the semiconductor chip and the substrate.

5. The method of manufacturing a thermal type flowmeter according to claim 1 ,

wherein a processing unit that is mounted to the substrate along with the semiconductor chip is provided, and

wherein the semiconductor chip is provided with two separate sets of a plurality of terminals that are electrically connected to the processing unit via wires, and the pressed surface is set at a position between the two sets of terminals.

6. The method of manufacturing a thermal type flowmeter according to claim 5 ,

wherein an inspection terminal of the semiconductor chip is provided on the pressed surface.

7. The method of manufacturing a thermal type flowmeter according to claim 1 ,

wherein the semiconductor chip includes a flow volume detection unit, and

wherein the heat transfer surface is formed of a diaphragm of the flow volume detection unit.

8. The method of manufacturing a thermal type flowmeter according to claim 1 ,

wherein the semiconductor chip includes a moisture detection unit, and

wherein the pressed surface is formed of a diaphragm of the moisture detection unit.

9. The method of manufacturing a thermal type flowmeter according to claim 1 ,

wherein the semiconductor chip includes a flow volume detection unit and a processing unit.

Assignments (2)
CHANGE OF NAME Recorded Mar 25, 2021
From: HITACHI AUTOMOTIVE SYSTEMS, LTD.
To: HITACHI ASTEMO, LTD.
Reel/Frame 056299/0447 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 15, 2016
From: TASHIRO, SHINOBU; TOKUYASU, NOBORU; KONO, TSUTOMU; MORINO, TAKESHI; WATANABE, TSUBASA
To: HITACHI AUTOMOTIVE SYSTEMS, LTD.
Reel/Frame 040739/0772 →