IP Library › Patent Application 14782306
Patent Application
App. No. 14/782,306

POLISHING PAD PRODUCTION METHOD

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Quick Facts
Patent No.
US None
App. No.
14/782,306
Abstract

The present invention is directed to a method for producing a polishing pad having a polishing layer comprising a sheet of a flexible polyurethane resin foam, the flexible polyurethane resin foam having an Asker D hardness of 30 or less at 25° C., and the method comprising: step A of cooling a block comprising the flexible polyurethane resin foam to be adjusted into an Asker D hardness of 35 or more; and step B of slicing the block, the Asker D hardness of which has been adjusted by the cooling, into a predetermined thickness to yield the sheet of the flexible polyurethane resin foam. The method for producing a polishing pad of the present invention makes it possible to slice, with a good precision, a block comprising a flexible polyurethane resin foam.

Claims (8)

1 . A method for producing a polishing pad having a polishing layer comprising a sheet of a flexible polyurethane resin foam,

the flexible polyurethane resin foam having an Asker D hardness of 30 or less at 25° C., and

the method comprising:

step A of cooling a block comprising the flexible polyurethane resin foam to be adjusted into an Asker D hardness of 35 or more, and

step B of slicing the block, the Asker D hardness of which has been adjusted by the cooling, into a predetermined thickness to yield the sheet of the flexible polyurethane resin foam.

2 . The method for producing a polishing pad according to claim 1 ,

wherein in step B,

a means for slicing the block into the predetermined thickness is in a planer manner.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 21, 2016
From: TOYO TIRE & RUBBER CO., LTD.
To: ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC.
Reel/Frame 038053/0917 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 2, 2015
From: KIMURA, TSUYOSHI
To: TOYO TIRE & RUBBER CO., LTD.
Reel/Frame 036720/0840 →