Pellicle frame and pellicle
The present invention is directed to a pellicle frame of a pellicle for use in photolithography, comprising: a coating of a layer containing a para-xylylene-based polymer. The invention can inhibit release of sulfate ions, ammonium ions and so on from the pellicle frame and thereby reduce the occurrence of haze under exposure environment.
1. A pellicle frame of a pellicle for use in photolithography, comprising:
a coating of a layer containing a para-xylylene-based polymer.
2. The pellicle frame according to claim 1 , wherein the para-xylylene-based polymer contains a halogen derivative of poly-para-xylylene.
3. The pellicle frame according to claim 1 , wherein the para-xylylene-based polymer contains poly-chloro-para-xylylene.
4. The pellicle frame according to claim 2 , wherein the para-xylylene-based polymer contains poly-chloro-para-xylylene.
5. The pellicle frame according to claim 1 , wherein the layer containing the para-xylylene-based polymer is transparent in a visible region of light.
6. The pellicle frame according to claim 2 , wherein the layer containing the para-xylylene-based polymer is transparent in a visible region of light.
7. The pellicle frame according to claim 3 , wherein the layer containing the para-xylylene-based polymer is transparent in a visible region of light.
8. The pellicle frame according to claim 4 , wherein the layer containing the para-xylylene-based polymer is transparent in a visible region of light.
9. The pellicle frame according to claim 1 , wherein the layer containing the para-xylylene-based polymer is formed by chemical vapor deposition.
10. The pellicle frame according to claim 8 , wherein the layer containing the para-xylylene-based polymer is formed by chemical vapor deposition.
11. The pellicle frame according to claim 1 , wherein a base of the pellicle frame is made of a black material.
12. The pellicle frame according to claim 10 , wherein a base of the pellicle frame is made of a black material.
13. The pellicle frame according to claim 1 , wherein a base of the pellicle frame is made of an aluminum alloy subjected to a black alumite process.
14. The pellicle frame according to claim 10 , wherein a base of the pellicle frame is made of an aluminum alloy subjected to a black alumite process.
15. A pellicle for use in photolithography, comprising:
a pellicle frame according to claim 1 ; and
a pellicle film stretched on the pellicle frame.
16. A pellicle for use in photolithography, comprising:
a pellicle frame according to claim 12 ; and
a pellicle film stretched on the pellicle frame.
17. A pellicle for use in photolithography, comprising:
a pellicle frame according to claim 14 ; and
a pellicle film stretched on the pellicle frame.
18. A pellicle frame of a pellicle for use in photolithography, comprising:
a base of the pellicle frame, where the base is made of a base material; and
a coating; wherein
the coating comprises a layer containing a para-xylylene-based polymer, the para-xylylene-based polymer being in direct contact with an outer surface of the base material of the base of the pellicle frame.
19. A pellicle frame of a pellicle for use in photolithography, comprising:
a base of the pellicle frame, the base having an outer surface, and
a layer containing a para-xylylene-based polymer, the para-xylylene-based polymer being in direct contact with the outer surface of the base of the pellicle frame; wherein
the layer containing the para-xylylene-based polymer coats the entire outer surface of the base of the pellicle frame.
20. The pellicle frame according to claim 19 , wherein a base material of the base of the pellicle frame is an aluminum alloy, and the outer surface of the base of the pellicle frame is a black oxide film.