IP Library Granted Patent US 9,941,708
Granted Patent B2
US 9,941,708 · App. 14/802,012 · Granted Apr 10, 2018

Systems, methods, and apparatus for integrated tuning capacitors in charging coil structure

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Quick Facts
Patent No.
US 9,941,708
App. No.
14/802,012
Granted
Apr 10, 2018
Kind
B2
Abstract

Systems, methods, and apparatus are disclosed for power transfer including a plurality of coil structures located over a ferrite element, the plurality of coil structures configured to generate a high flux region and a low flux region, the low flux region being located between the plurality of coil structures, and a tuning capacitance located directly over the ferrite element in the low flux region.

Claims (27)

1. A device for power transfer, comprising:

a plurality of coil structures located over a ferrite element, the plurality of coil structures configured to generate a high flux region and a low flux region, the low flux region being located between the plurality of coil structures; and

a tuning capacitance located directly over the ferrite element in the low flux region.

2. The device of claim 1 , wherein the plurality of coil structures are “D” shaped.

3. The device of claim 1 , wherein the plurality of coil structures comprise multiple vertically stacked coils.

4. The device of claim 1 , wherein the low flux region is dependent on an amount of current present in the plurality of coil structures.

5. The device of claim 1 , wherein the tuning capacitance comprises a plurality of surface mount capacitors located on a printed circuit board located between the plurality of coil structures directly over the ferrite element in the low flux region.

6. The device of claim 1 , wherein an electrical characteristic of the high flux region defines an electrical characteristic of the low flux region.

7. The device of claim 1 , wherein the high flux region is formed by a plurality of high flux regions in an absence of a charging-receiving structure.

8. The device of claim 1 , wherein the high flux region is formed by a plurality of high flux regions in a presence of a charging-receiving structure.

9. A method for power transfer, comprising:

locating a plurality of coil structures over a ferrite element;

generating a high flux region and a low flux region, the low flux region being located between the plurality of coil structures; and

locating a tuning capacitance directly over the ferrite element in the low flux region.

10. The method of claim 9 , further comprising forming the plurality of coil structures as “D” shaped.

11. The method of claim 9 , further comprising forming the plurality of coil structures as multiple vertically stacked coils.

12. The method of claim 9 , wherein the low flux region is dependent on an amount of current present in the plurality of coil structures.

13. The method of claim 9 , further comprising forming the tuning capacitance as a plurality of surface mount capacitors located on a printed circuit board located between the plurality of coil structures directly over the ferrite element in the low flux region.

14. The method of claim 9 , further comprising using an electrical characteristic of the high flux region to define an electrical characteristic of the low flux region.

15. The method of claim 9 , further comprising forming the high flux region using a plurality of high flux regions in an absence of a charging-receiving structure.

16. The method of claim 9 , further comprising forming the high flux region using a plurality of high flux regions in a presence of a charging-receiving structure.

17. A device for power transfer, comprising:

means for generating a high flux region and a low flux region, the low flux region being located between a plurality of coil structures; and

means for locating a tuning capacitance directly over a ferrite element in the low flux region.

18. The device of claim 17 , further comprising means for forming the plurality of coil structures as “D” shaped.

19. The device of claim 17 , further comprising means for forming the high flux region using a plurality of high flux regions in an absence of a charging-receiving structure.

20. The device of claim 17 , further comprising means for forming the high flux region using a plurality of high flux regions in a presence of a charging-receiving structure.

Assignments (5)
ASSIGNMENT OF SECURITY INTEREST Recorded Dec 18, 2025
From: AIR WAVES WIRELESS ELECTRICITY IV, LLC
To: WITRICITY AI TECH, LLC
Reel/Frame 074004/0929 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 16, 2025
From: WITRICITY CORPORATION
To: WITRICITY AI TECH, LLC
Reel/Frame 073982/0106 →
SECURITY INTEREST Recorded Dec 5, 2025
From: WITRICITY CORPORATION; WITRICITY HOLDINGS, INC.
To: AIR WAVES WIRELESS ELECTRICITY IV, LLC, AS COLLATERAL AGENT FOR LENDERS
Reel/Frame 073860/0204 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 18, 2019
From: QUALCOMM INCORPORATED
To: WITRICITY CORPORATION
Reel/Frame 048357/0455 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 25, 2015
From: KEELING, NICHOLAS ATHOL; KISSIN, MICHAEL LE GALLAIS; BUDHIA, MICKEL BIPIN; HUANG, CHANG-YU; BEAVER, JONATHAN; HAO, HAO; CAMASCA RAMIREZ, CLAUDIO ARMANDO
To: QUALCOMM INCORPORATED
Reel/Frame 036654/0864 →