Substrate cleaning method and recording medium
An object of the present invention is to be able to obtain a high removing performance of particles. The substrate processing method according to the exemplary embodiment comprises a film-forming treatment solution supply step and a removing solution supply step. The film-forming treatment solution supply step comprising supplying to a substrate, a film-forming treatment solution containing an organic solvent and a fluorine-containing polymer that is soluble in the organic solvent is supplied. The removing solution supply step comprises supplying to a treatment film formed by solidification or curing of the film-forming treatment solution on the substrate, a removing solution capable of removing the treatment film.
1. A substrate cleaning method comprising:
supplying to a substrate to which a particle is attached, a film-forming treatment solution comprising an organic solvent and a fluorine-containing polymer that is soluble in the organic solvent;
forming a treatment film comprising the particle incorporated into the treatment film by solidification or curing of the film-forming treatment solution on the substrate;
supplying a treatment solvent or solution to the treatment film on the substrate, wherein the treatment solvent is selected from at least one of pure water and a fluorine-based solvent, and the treatment solution is selected from a group consisting of at least one of pure water mixed with a CO 2 gas, water to which a surfactant is added, and isopropyl alcohol diluted with pure water;
separating the particle and the treatment film from the substrate;
supplying, a dissolving treatment solvent or solution to the substrate, the dissolving treatment solvent or solution dissolving the treatment film, and forming on the substrate, a first mixture comprising the treatment solvent or solution, the dissolving solvent or solution, the dissolved treatment film and the particle, wherein the dissolving treatment solvent or solution is selected from:
a group consisting of an alkaline aqueous solution being selected from at least one of water mixed with an ammonia, water mixed with a quaternary ammonium hydroxide, and water mixed with choline;
an alkaline developing solution to which a hydrogen peroxide is added, the alkaline developing solution being selected from at least one of water mixed with ammonia, water mixed with a quaternary ammonium hydroxide, and water mixed with choline;
an acidic developing solvent, the acidic developing solvent being selected from at least one of acetic acid, formic acid, and hydroxyacetic acid; and
an organic solvent, the organic solvent being selected from at least one of 4-methyl-2-pentanol, a thinner, toluene, acetate esters, alcohols, and glycols, and
wherein the dissolving treatment solvent or solution differs from the treatment solvent or solution; and
supplying a rinsing solvent to the first mixture on the substrate to remove the first mixture from the substrate.
2. The substrate cleaning method according to claim 1 , wherein the polymer has a partial structure represented by the following formula (1):
wherein
R 1 and R 2 each independently represents a hydrogen atom, a fluorine atom, an alkyl group having 1 to 8 carbon atoms, or a fluorinated alkyl group having 1 to 8 carbon atoms, provided that at least one of R 1 and R 2 is a fluorine atom or a fluorinated alkyl group having 1to 8 carbon atoms; and
the symbol * shows a bonding site with another atom constituting the polymer.
3. The substrate cleaning method according to claim 1 , wherein the polymer comprises a cyclic polyolefin having a partial structure represented by the following formula (1):
wherein
R 1 and R 2 each independently represents a hydrogen atom, a fluorine atom, an alkyl group having 1 to 8 carbon atoms, or a fluorinated alkyl group having 1 to 8 carbon atoms, provided that at least one of R 1 and R 2 is a fluorine atom or a fluorinated alkyl group having 1 to 8 carbon atoms; and
the symbol * shows a bonding site with another atom constituting the polymer.
4. The substrate cleaning method according to claim 1 , wherein the polymer comprises a poly(meth)acrylate having a partial structure represented by the following formula (1):
wherein
R 1 and R 2 each independently represents a hydrogen atom, a fluorine atom, an alkyl group having 1 to 8 carbon atoms, or a fluorinated alkyl group having 1 to 8 carbon atoms, provided that at least one of R 1 and R 2 is a fluorine atom or a fluorinated alkyl group having 1 to 8 carbon atoms; and
the symbol * shows a bonding site with another atom constituting the polymer.
5. The substrate cleaning method according to claim 1 , wherein the quaternary ammonium hydroxide solution contains tetramethyl ammonium hydroxide (TMAH).
6. The substrate cleaning method according to claim 1 , wherein the dissolving treatment solvent or solution is supplied to the substrate, together with a surfactant.
7. The substrate cleaning method according to claim 2 , wherein the film-forming treatment solution further contains a low-molecular-weight organic acid.
8. The substrate cleaning method according to claim 2 , wherein the film-forming treatment solution further contains water.
9. The substrate cleaning method according to claim 7 , wherein the low-molecular-weight organic acid is a polycarboxylic acid.
10. A non-transitory computer-readable recording medium storing a program that is executable by a computer and controls a substrate cleaning system, wherein upon execution of the program, the computer controls the substrate cleaning system so that a substrate cleaning method is performed, the substrate cleaning method comprising:
supplying to a substrate to which a particle is attached, a film-forming treatment solution comprising an organic solvent and a fluorine-containing polymer that is soluble in the organic solvent;
forming a treatment film comprising the particle incorporated into the treatment film by solidification or curing of the film-forming treatment solution on the substrate;
supplying a treatment solvent or solution to the treatment film on the substrate, wherein the treatment solvent is selected from at least one of pure water and a fluorine-based solvent, and the treatment solution is selected from a group consisting of at least one of pure water mixed with a CO 2 gas, water to which a surfactant is added, and isopropyl alcohol diluted with pure water;
separating the particle and the treatment film from the substrate;
supplying a dissolving treatment solvent or solution to the substrate, the dissolving treatment solvent or solution dissolving the treatment film, and forming on the substrate, a first mixture comprising the treatment solvent or solution, the dissolving treatment solvent or solution, the dissolved treatment film and the particle, wherein the dissolving treatment solvent or solution is selected from:
a group consisting of an alkaline aqueous solution being selected from at least one of water mixed with an ammonia, water mixed with a quaternary ammonium hydroxide, and water mixed with choline;
an alkaline developing solution to which a hydrogen peroxide is added, the alkaline developing solution being selected from at least one of water mixed with ammonia, water mixed with a quaternary ammonium hydroxide, and water mixed with choline;
an acidic developing solvent, the acidic developing solvent being selected from at least one of acetic acid, formic acid, and hydroxyacetic acid; and
an organic solvent, the organic solvent being selected from at least one of 4-methyl-2-pentanol, a thinner, toluene, acetate esters, alcohols, and glycols, and
wherein the dissolving treatment solvent or solution differs from the treatment solvent or solution; and
supplying a rinsing solvent to the first mixture on the substrate to remove the first mixture from the substrate.