Method of forming mark pattern, recording medium and method of generating mark data
View Patent ↗In a method of forming a mark pattern according to the embodiments, a film to be processed on a substrate is coated with a photosensitive film, and the photosensitive film is irradiated with exposure light via a mask. On the mask, a first circuit pattern having a first transmittance and a mark having a second transmittance and used to measure a superposition between films are arranged. By irradiating with the exposure light, a second circuit pattern having a first film thickness and a mark pattern having a second film thickness thinner than the first film thickness are formed on the substrate.
1. A method of forming a mark pattern comprising:
coating a film to be processed on a substrate with a photosensitive film;
irradiating the photosensitive film with exposure light via a mask, the mask including a first mask pattern region and a second mask pattern region, the first mask pattern region being a region in which a first circuit pattern is arranged, the first circuit pattern having a first transmittance, the second mask pattern region being a region in which the mark pattern to be used to measure a superposition between films is arranged, the mark having a second transmittance;
developing the photosensitive film so that the first circuit pattern and the mark pattern are transferred to the photosensitive film, the transferred first circuit pattern having a first film thickness, the transferred mark pattern having a second film thickness, the second film thickness being thinner than the first film thickness.
2. The method of forming a mark pattern according to claim 1 , wherein
the mark pattern is formed on the substrate by using gray scale lithography.
3. The method of forming a mark pattern according to claim 1 , wherein
first pattern occupancy of a light shielding portion of the mark pattern is lower than second pattern occupancy of a light shielding portion of the first circuit pattern.
4. The method of forming a mark pattern according to claim 1 , wherein
the second film thickness has an aspect ratio of equal to or less than ten times relative to a wavelength of the exposure light.
5. The method of forming a mark pattern according to claim 1 , wherein
the film to be processed is a film to be used for a stacked semiconductor apparatus.
6. The method of forming a mark pattern according to claim 1 , wherein
the mark pattern is formed in a scribe area on the substrate.
7. The method of forming a mark pattern according to claim 1 , wherein
the mark pattern is a pillar pattern having a rectangular upper surface.