IP Library Granted Patent US 9,653,681
Granted Patent B2
US 9,653,681 · App. 14/838,535 · Granted May 16, 2017

Semiconductor memory device

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Quick Facts
Patent No.
US 9,653,681
App. No.
14/838,535
Granted
May 16, 2017
Kind
B2
Abstract

According to one embodiment, a semiconductor memory device includes a plurality of first resistance-change memory elements of a two-terminal type, a second resistance-change memory element of a two-terminal type, a rectifier element of a two-terminal type, a local bit line connected to ends of the first resistance-change memory elements, an end of the second resistance-change memory element and an end of the rectifier element, and a global bit line connected to the other end of the second resistance-change memory element.

Claims (34)

1. A semiconductor memory device comprising:

a plurality of first resistance-change memory elements of a two-terminal type;

a second resistance-change memory element of a two-terminal type;

a third resistance-change memory element of a two-terminal type;

a local bit line connected to one end of each of the first resistance-change memory elements, one end of the second resistance-change memory element and one end of the third resistance-change memory element; and

a global bit line connected to the other end of the second resistance-change memory element.

2. The device of claim 1 , wherein

the second resistance-change memory element is set to a high-resistance state by supplying a high-resistance-state setting signal between the other end of the third resistance-change memory element and the global bit line, and the second resistance-change memory element is set to a low-resistance state having a resistance lower than that in the high-resistance state by supplying a low-resistance-state setting signal between the other end of the third resistance-change memory element and the global bit line, and

data is written and read for a desired one of the first resistance-change memory elements connected to the second resistance-change memory element set to the low-resistance state.

3. The device of claim 2 , wherein

the first resistance-change memory elements, the second resistance-change memory element and the third resistance-change memory element are stacked vertically.

4. The device of claim 3 , wherein

the first resistance-change memory elements, the second resistance-change memory element and the third resistance-change memory element are selected from a chalcogenide material including GeSbTe, a superlattice material of GeTe and SbTe, a binary or ternary transition metal oxide material, an oxide material containing Au or Cu, and a chalcogenide material containing Au or Cu.

5. The device of claim 2 , wherein

the first resistance-change memory elements, the second resistance-change memory element and the third resistance-change memory element are selected from a chalcogenide material including GeSbTe, a superlattice material of GeTe and SbTe, a binary or ternary transition metal oxide material, an oxide material containing Au or Cu, and a chalcogenide material containing Au or Cu.

6. The device of claim 1 , wherein

the first resistance-change memory elements, the second resistance-change memory element and the third resistance-change memory element are stacked vertically.

7. The device of claim 6 , wherein

the first resistance-change memory elements, the second resistance-change memory element and the third resistance-change memory element are selected from a chalcogenide material including GeSbTe, a superlattice material of GeTe and SbTe, a binary or ternary transition metal oxide material, an oxide material containing Au or Cu, and a chalcogenide material containing Au or Cu.

8. The device of claim 1 , wherein

the first resistance-change memory elements, the second resistance-change memory element and the third resistance-change memory element are selected from a chalcogenide material including GeSbTe, a superlattice material of GeTe and SbTe, a binary or ternary transition metal oxide material, an oxide material containing Au or Cu, and a chalcogenide material containing Au or Cu.

9. The device of claim 1 , wherein

the second resistance-change memory element is connected between the local bit line and the global bit line.

10. The device of claim 1 , wherein

each of the first resistance-change memory elements is connected between the local bit line and a word line.

11. The device of claim 1 , wherein

the third resistance-change memory element is connected between the local bit line and a select switch control signal line to which a voltage for selecting the plurality of first resistance-change memory elements is applied.

12. The device of claim 1 , wherein

the global bit line is connected to a sense-amplifier and a writing driver.

13. The device of claim 1 , wherein

the second resistance-change memory element is connected between the local bit line and the global bit line,

each of the first resistance-change memory elements is connected between the local bit line and a word line,

the third resistance-change memory element is connected between the local bit line and a select switch control signal line to which a voltage for selecting the plurality of first resistance-change memory elements is applied, and

the global bit line is connected to a sense-amplifier and a writing driver.

Assignments (5)
MERGER Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 22, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043620/0798 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 28, 2015
From: TAKASHIMA, DAISABURO
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 036445/0508 →