IP Library Granted Patent US 9,443,901
Granted Patent B2
US 9,443,901 · App. 14/841,290 · Granted Sep 13, 2016

Image sensor having lens type color filter and method for fabricating the same

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Quick Facts
Patent No.
US 9,443,901
App. No.
14/841,290
Granted
Sep 13, 2016
Kind
B2
Abstract

The image sensor includes lens-type color filters having a uniform shape for a plurality of pixels. The image sensor includes a plurality of pixels formed in a substrate, a plurality of color filter housings formed over outer boundaries of the respective pixels, and a plurality of color filters filled in spaces defined by the respective color filter housings, wherein the clock filter housings surround edges of the respective color filters with a given curvature.

Claims (16)

1. A method for forming an image sensor, the method comprising:

forming sacrificial patterns over a substrate including a plurality of pixels, corresponding to the respective pixels;

performing a reflow process on the sacrificial patterns to have a round edge;

forming a mold layer along a surface of a structure including the sacrificial patterns;

patterning the mold layer using mask patterns as an etching mask to form a plurality of color filter housings surrounding edges of the respective sacrificial patterns with a given curvature;

removing the mask patterns and the sacrificial patterns to form spaces defined by the color filter housings; and

filling the spaces with color filter materials to form a plurality of color filters over the respective pixels.

2. The method of claim 1 , further comprising:

forming a protection layer over a structure including the color filters and the color filter housings.

3. The method of claim 1 , wherein the sacrificial patterns cover the respective pixels and exposes outer boundaries of the respective pixels.

4. The method of claim 1 , wherein the mold layer includes material whose refractive index is larger than that of air and smaller than that of the color filters.

5. The method of claim 1 , wherein the mask patterns cover the respective pixels while having openings exposing centers of the respective pixels.

6. The method of claim 1 , wherein the mask patterns and the sacrificial patterns include the same material.

7. The method of claim 2 , wherein the protection layer has a refractive index larger than that of air and smaller than those of the color filters and the color filter housings.

8. The method of claim 2 , further comprising:

forming microlens over the protection, corresponding to the respective pixels.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 7, 2024
From: SK HYNIX INC.
To: MIMIRIP LLC
Reel/Frame 067335/0246 →