Semiconductor manufacturing apparatus and semiconductor manufacturing method

1. A semiconductor manufacturing apparatus comprising:

a housing configured to house a substrate;

a first temperature regulator configured to regulate a temperature of a fluid;

first, second and third flow channels configured to divide the fluid supplied from the first temperature regulator;

a second temperature regulator configured to regulate a temperature of the fluid in the second channel;

a third temperature regulator configured to regulate a temperature of the fluid in the third flow channel;

a fluid supply channel configured to join the fluid in the first flow channel and the fluid in the second flow channel and to supply the joined fluids to the housing; and

a flow rate regulator configured to regulate a flow rate of the fluid in the first flow channel and a flow rate of the fluid in the second flow channel;

wherein the fluid in the first flow channel, the fluid in the second flow channel, and the fluid in the third flow channel flow into the fluid supply channel.

2. The apparatus of claim 1 , wherein

the first temperature regulator regulates the temperature of the fluid to a first temperature,

the second temperature regulator regulates the temperature of the fluid in the second flow channel to a second temperature, and

the flow rate regulator regulates a temperature of the joined fluids in the fluid supply channel to a third temperature that is between the first temperature and the second temperature.

3. The apparatus of claim 1 , wherein the first temperature regulator is a chiller configured to cool the fluid.

4. The apparatus of claim 1 , wherein the second temperature regulator is a heater configured to heat the fluid in the second flow channel.

5. The apparatus of claim 4 , wherein the second temperature regulator is a heater jacket or a ribbon heater, the heater jacket or the ribbon heater being wound around the second flow channel.

6. The apparatus of claim 1 , wherein the housing processes the substrate by using plasma.

7. The apparatus of claim 1 , wherein the housing comprises upper and lower electrodes that apply a voltage to the substrate and an insulator covering the lower electrode, the substrate being mounted on the lower electrode through the insulator.

8. The apparatus of claim 1 , comprising a temperature detector configured to detect a temperature of a portion in the housing,

wherein the flow rate regulator regulates a flow rate of the fluid in the first flow channel and a flow rate of the fluid in the second flow channel, based on the temperature of the portion in the housing detected by the temperature detector.

9. The apparatus of claim 1 , further comprising a flow channel configured to supply the fluid discharged from the housing to the first temperature regulator.

10. A semiconductor manufacturing apparatus comprising:

a housing configured to house a substrate;

a first temperature regulator configured to regulate a temperature of a fluid;

a second temperature regulator configured to regulate a temperature of the fluid;

a third temperature regulator configured to regulate a temperature of the fluid;

a fluid supply channel configured to join a first fluid that has passed through only the first temperature regulator of the first and second temperature regulators and a second fluid that has passed through both of the first and second temperature regulators and to supply the joined first and second fluids to the housing; and

a flow rate regulator configured to regulate a ratio between a flow rate of the first fluid and a flow rate of the second fluid;

wherein the first fluid, the second fluid, and a third fluid that has passed through the third temperature regulator flow into the fluid supply channel.

11. A semiconductor manufacturing method comprising:

housing a substrate in a housing;

regulating a temperature of a fluid by a first temperature regulator;

dividing the fluid supplied from the first temperature regulator to first, second and third flow channels;

regulating a temperature of the fluid in the second flow channel by a second temperature regulator;

regulating a temperature of the fluid in the third flow channel by a third temperature regulator;

joining the fluid in the first flow channel and the fluid in the second flow channel and supplying the joined fluids to the housing via a fluid supply channel; and

regulating a ratio between a flow rate of the fluid in the first flow channel and a flow rate of the fluid in the second flow channel by a flow rate regulator;

wherein the fluid in the first flow channel, the fluid in the second flow channel, and the fluid in the third flow channel flow into the fluid supply channel.

12. The method of claim 11 , further comprising regulating a temperature of a portion in the housing by the fluid from the fluid supply channel.

13. The method of claim 11 , wherein

the first temperature regulator regulates the temperature of the fluid to a first temperature,

the second temperature regulator regulates the temperature of the fluid in the second flow channel to a second temperature, and

the flow rate regulator regulates a temperature of the joined fluids in the fluid supply channel to a third temperature that is between the first temperature and the second temperature.

14. The method of claim 11 , wherein the first temperature regulator is a chiller configured to cool the fluid.

15. The method of claim 11 , wherein the second temperature regulator is a heater configured to heat the fluid in the second flow channel.

16. The method of claim 11 , wherein the housing processes the substrate by using plasma.

17. The method of claim 11 , wherein the housing comprises upper and lower electrodes that apply a voltage to the substrate and an insulator covering the lower electrode, the substrate being mounted on the lower electrode through the insulator.

18. The method of claim 11 , comprising detecting a temperature of a portion in the housing by a temperature detector,

wherein the flow rate regulator regulates a flow rate of the fluid in the first flow channel and a flow rate of the fluid in the second flow channel, based on the temperature of the portion in the housing detected by the temperature detector.