Compositions comprising zwitterionic alkyl-alkanoylamides and/or alkyl alkanoates
View Patent ↗The present invention provides compositions utilizing a first zwitterionic ammonio-alkanamide and/or zwitterionic ammonio-alkanoate surfactant according to Formula 1 and an ingredient selected from the group consisting a surfactant other than the first zwitterionic surfactant, emulsifiers, conditioning agents, emollients, moisturizers, humectants, thickeners, lubricants, chelating agents, fillers, binding agents, anti-oxidants, preservatives, active ingredients, fragrances, dyes, buffering agents, exfoliates, pH adjusters, inorganic salts, solvents, viscosity controlling agents and opacifying agents, wherein the composition is substantially free of alkylamidoamine and aminoalkylamine.
1. A composition comprising a first zwitterionic surfactant comprising 3-((4-coconylamino)-4-oxobutyl)dimethylammonio)-2-hydroxypropane-1-sulfonate;
and a second surfactant other than said first zwitterionic surfactant, said second surfactant selected from the group consisting of anionic surfactant, cationic surfactant, nonionic surfactant, a zwitterionic surfactant other than the first zwitterionic surfactant, and mixtures thereof; and an ingredient selected from the group consisting of emulsifiers, conditioning agents, emollients, moisturizers, humectants, thickeners, lubricants, chelating agents, fillers, binding agents, anti-oxidants, preservatives, active ingredients, fragrances, dyes, buffering agents, exfoliates, pH adjusters, inorganic salts, solvents, viscosity controlling agents and opacifying agents, wherein said composition is substantially free of alkylamidoamine and aminoalkylamine.
2. The composition of claim 1 wherein said composition is free of alkylamidoamine and aminoalkylamine.
3. The composition of claim 1 wherein said composition is substantially free of an anionic surfactant.
4. The composition of claim 1 wherein said composition is substantially free of a sulfated anionic surfactant.
5. The composition of claim 1 comprising from about 0.1% to about 30% of said first zwitterionic surfactant.
6. The composition of claim 1 comprising from about 1% to about 10% of said first zwitterionic surfactant.
7. The composition of claim 3 wherein said first zwitterionic surfactant and said second surfactant are present at a weight ratio of from about 0.003 to about 300.
8. The composition of claim 3 wherein said first zwitterionic surfactant and said second surfactant are present at a weight ratio of from about 0.1 to about 10.
9. The composition of claim 1 having a pH of from about 3 to about 9.
10. The composition of claim 1 comprising from about 0.05 to about 6 weight percent of said inorganic salt.
11. The composition of claim 1 wherein said composition is substantially free of a zwitterionic surfactant comprising an amide moiety.
12. The composition of claim 1 wherein said composition is free of a zwitterionic surfactant comprising an amide moiety.