IP Library Granted Patent US 11,420,304
Granted Patent B2
US 11,420,304 · App. 14/864,649 · Granted Aug 23, 2022

Superabrasive elements and methods for processing and manufacturing the same using protective layers

Inventors: David P. Miess (Highland, UT); Andrew E. Dadson (Provo, GH)
Assignee: US Synthetic Corporation
B24D3/005B24D18/0009B24D18/0054B24D99/005F16C33/043F16C33/26F16C17/02F16C17/04
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,420,304
App. No.
14/864,649
Granted
Aug 23, 2022
Kind
B2
Abstract

A method of processing a polycrystalline diamond element includes forming a protective layer over a selected portion of a polycrystalline diamond element, the polycrystalline diamond element having a polycrystalline diamond table that includes a superabrasive face, a superabrasive side surface, and a chamfer extending between the superabrasive face and the superabrasive side surface. A portion of the superabrasive side surface is covered by the protective layer and the protective layer is not formed over the chamfer. The method includes exposing at least a portion of the polycrystalline diamond element to a leaching solution. A polycrystalline diamond element has a polycrystalline diamond table that includes a leached volume extending from the superabrasive face to a portion of the chamfer proximate to the superabrasive side surface, and the leached volume does not substantially extend along the superabrasive side surface.

Claims (43)

1. A polycrystalline diamond element, comprising:

a polycrystalline diamond table comprising:

a superabrasive face;

a superabrasive side surface extending around an outer periphery of the superabrasive face; and

a chamfer extending between the superabrasive face and the superabrasive side surface;

wherein:

the polycrystalline diamond table comprises an unleached volume and a leached volume, the leached volume only extending from the superabrasive face to a portion of the chamfer diagonally adjacent to the superabrasive side surface;

the leached volume along the portion of the chamfer extends to a depth from the superabrasive face that is greater than a depth that the leached volume along the superabrasive face extends from the superabrasive face;

the leached volume along the portion of the chamfer terminates at a circumferential stepped portion defined by the unleached volume, a portion of the unleached volume defining an outer circumferential surface of the polycrystalline diamond table; and

the leached volume including the portion of the chamfer radially surrounds at least a portion of the unleached volume positioned at the same axial extent of the polycrystalline diamond table as the portion of the chamfer.

2. The polycrystalline diamond element of claim 1 , further comprising a substrate bonded to the polycrystalline diamond table.

3. The polycrystalline diamond element of claim 1 , wherein the polycrystalline diamond table further comprises a transition region between the leached volume and the unleached volume of the polycrystalline diamond table.

4. The polycrystalline diamond element of claim 3 , wherein the transition region extends to an intersection between the chamfer and the superabrasive side surface.

5. The polycrystalline diamond element of claim 1 , wherein the leached volume does not extend along the superabrasive side surface.

6. The polycrystalline diamond element of claim 1 , wherein:

the polycrystalline diamond table comprises a transition region between the leached volume and the unleached volume of the polycrystalline diamond table; and

at least a portion of the transition region extends away from the superabrasive side surface toward the superabrasive face.

7. The polycrystalline diamond element of claim 1 , wherein the polycrystalline diamond table was formed with a protective layer positioned around the polycrystalline diamond table, the protective layer configured to substantially prevent the leached volume from extending past the chamfer to the superabrasive side surface.

8. The polycrystalline diamond element of claim 1 , further comprising a protective layer positioned around the polycrystalline diamond table during a leaching process to define the leached volume, the protective layer configured to substantial prevent the leached volume from extending to a portion of the superabrasive side surface.

9. A polycrystalline diamond element, comprising:

a polycrystalline diamond table comprising:

a superabrasive face;

a superabrasive side surface positioned around an outer periphery of the superabrasive face;

a chamfer extending between the superabrasive face and the superabrasive side surface;

a leached portion having been exposed to a leaching process, the leached portion including the superabrasive face and only a portion of the chamfer, the leached portion including the portion of the chamfer extending from the superabrasive face axially beyond the leached portion including the superabrasive face; and

an unleached portion having been substantially isolated from the leaching process, the unleached portion including at least a portion of the superabrasive side surface and an unleached inner portion of the polycrystalline diamond table, the unleached inner portion being radially bordered by the leached portion including the only the portion of the chamfer, the unleached portion defining a radially outward interface between the unleached portion and an axial end of the leached portion including the portion of the chamfer, the radially outward interface being positioned at an axial location that is further from the superabrasive face than the unleached inner portion, the radially outward interface extending radially from the unleached inner portion to an outer surface of the polycrystalline diamond table and defining a portion of the outer surface of the polycrystalline diamond table.

10. The polycrystalline diamond element of claim 9 , wherein the unleached portion includes a substantial entirety of the superabrasive side surface.

11. The polycrystalline diamond element of claim 9 , wherein a substantial entirety of the superabrasive side surface was isolated from the leaching process.

12. The polycrystalline diamond element of claim 9 , wherein the unleached inner portion is radially surrounded by the leached portion including the at least a portion of the chamfer.

13. The polycrystalline diamond element of claim 9 , wherein the polycrystalline diamond table included a protective layer positioned around the polycrystalline diamond table during the leaching process in order to define the unleached portion.

14. The polycrystalline diamond element of claim 9 , further comprising a protective layer positioned around the unleached portion of the polycrystalline diamond table during the leaching process.

15. The polycrystalline diamond element of claim 14 , wherein the protective layer is configured to surround an entirety of the superabrasive side surface.

16. A polycrystalline diamond element, comprising:

a polycrystalline diamond table comprising:

a superabrasive face;

a superabrasive side surface positioned about an outer periphery of the superabrasive face;

a chamfer between the superabrasive face and the superabrasive side surface;

a leached portion having been exposed to a leaching process, the leached portion including the superabrasive face and only a portion of the chamfer; and

an unleached portion having been substantially isolated from the leaching process, the unleached portion including at least a portion of the superabrasive side surface and an unleached inner portion of the polycrystalline diamond table, wherein the unleached portion includes a substantial entirety of the superabrasive side surface, and wherein the unleached portion defines a circumferential stepped portion at an interface between the unleached portion and an axial end of the leached portion including the portion of the chamfer, a portion of the circumferential stepped portion defining a radially outward surface of the polycrystalline diamond table.

17. The polycrystalline diamond element of claim 16 , wherein the unleached inner portion is radially bordered by the leached portion including the at least a portion of the chamfer.

18. The polycrystalline diamond element of claim 17 , wherein the unleached inner portion is axially bordered by the superabrasive face.

19. The polycrystalline diamond element of claim 16 , further comprising a protective layer positioned around the unleached portion of the polycrystalline diamond table during the leaching process to at least partially isolate the unleached portion from a leaching solution used in the leaching process, wherein the protective layer is configured to be removed after the leaching process.

20. The polycrystalline diamond element of claim 19 , wherein a substantially entirety the superabrasive side surface is isolated from the leaching process by the protective layer.

Assignments (5)
SECURITY INTEREST Recorded Jul 18, 2025
From: US SYNTHETIC CORPORATION
To: KEYBANK NATIONAL ASSOCIATION
Reel/Frame 074973/0089 →
RELEASE OF SECURITY INTEREST Recorded Jun 7, 2022
From: BANK OF AMERICA, N.A.
To: ACE DOWNHOLE, LLC; HARBISON-FISCHER, INC.; NORRIS RODS, INC.; PCS FERGUSON, INC.; QUARTZDYNE, INC.; SPIRIT GLOBAL ENERGY SOLUTIONS, INC.; THETA OILFIELD SERVICES, INC.; APERGY BMCS ACQUISITION CORP.; NORRISEAL-WELLMARK, INC.; US SYNTHETIC CORPORATION; WINDROCK, INC.
Reel/Frame 060305/0001 →
SECURITY INTEREST Recorded Jun 5, 2020
From: ACE DOWNHOLE, LLC; APERGY BMCS ACQUISITION CORP.; HARBISON-FISCHER, INC.; NORRIS RODS, INC.; NORRISEAL-WELLMARK, INC.; PCS FERGUSON, INC.; QUARTZDYNE, INC.; SPIRIT GLOBAL ENERGY SOLUTIONS, INC.; THETA OILFIELD SERVICES, INC.; US SYNTHETIC CORPORATION; WINDROCK, INC.
To: BANK OF AMERICA, N.A.
Reel/Frame 053790/0001 →
SECURITY AGREEMENT Recorded May 9, 2018
From: APERGY (DELAWARE) FORMATION, INC.; APERGY BMCS ACQUISITION CORP.; APERGY ENERGY AUTOMATION, LLC; HARBISON-FISCHER, INC.; NORRISEAL-WELLMARK, INC.; PCS FERGUSON, INC.; QUARTZDYNE, INC.; SPIRIT GLOBAL ENERGY SOLUTIONS, INC.; US SYNTHETIC CORPORATION; WINDROCK, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 046117/0015 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 24, 2015
From: MIESS, DAVID P.; DADSON, ANDREW E.; SANI, MOHAMMAD NAJAFI
To: US SYNTHETIC CORPORATION
Reel/Frame 036651/0234 →