IP Library Granted Patent US 9,748,397
Granted Patent B2
US 9,748,397 · App. 14/873,236 · Granted Aug 29, 2017

Thin film transistor substrate and display device comprising the same

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Quick Facts
Patent No.
US 9,748,397
App. No.
14/873,236
Granted
Aug 29, 2017
Kind
B2
Abstract

A thin-film transistor substrate is disclosed, which comprises a base layer; a semiconductor layer disposed on the base layer; a source electrode and a drain electrode disposed on the semiconductor layer; and a gate electrode disposed on the base layer and corresponding to the semiconductor layer; wherein the semiconductor layer includes a first region, a second region, and a third region, in which the first region corresponds to the gate electrode layer, the second region corresponds to the source electrode, and the third region corresponds to the drain electrode; and wherein the first region has a first thickness, the second region has a second thickness, and the third region has a third thickness, and the first thickness is greater than the second thickness or the third thickness.

Claims (25)

1. A thin-film transistor substrate, comprising:

a base layer;

a semiconductor layer disposed on the base layer;

a source electrode and a drain electrode disposed on the semiconductor layer; and

a gate electrode disposed on the semiconductor layer;

wherein the semiconductor layer includes a first region, a second region, and a third region, in which the first region corresponds to the gate electrode layer, the second region corresponds to the source electrode, and the third region corresponds to the drain electrode; and

wherein the first region has a first thickness, the second region has a second thickness, and the third region has a third thickness, and the first thickness is greater than the second thickness or the third thickness.

2. The thin-film transistor substrate of claim 1 , wherein the second thickness or the third thickness is 1-50% of the first thickness.

3. The thin-film transistor substrate of claim 1 , wherein the semiconductor layer further comprises a fourth region located between the first region and the second region, and the fourth region has a fourth thickness between the first thickness and the second thickness.

4. The thin-film transistor substrate of claim 3 , wherein the second thickness is 1-50% of the fourth thickness.

5. The thin-film transistor substrate of claim 1 , wherein the semiconductor layer further comprises a fifth region located between the first region and the third region, and the fifth region has a fifth thickness between the first thickness and the third thickness.

6. The thin-film transistor substrate of claim 5 , wherein the third thickness is 1-50% of the fifth thickness.

7. The thin-film transistor substrate of claim 1 , wherein the second region has a first side adjacent to the first region and a second side opposite to the first side; and

the semiconductor layer further comprises a sixth region which is adjacent to the second side of the second region, and the sixth region has a sixth thickness between the first thickness and the second thickness.

8. The thin-film transistor substrate of claim 1 , wherein the third region has a first side adjacent to the first region and a second side opposite to the first side; and

the semiconductor layer further comprises a seventh region which is adjacent to the second side of the third region, and the seventh region has a seventh thickness between the first thickness and the third thickness.

9. The thin-film transistor substrate of claim 1 , which is a top gate thin-film transistor substrate.

10. The thin-film transistor substrate of claim 1 , wherein the semiconductor layer is made of indium gallium zinc oxide (IGZO), indium tin zinc oxide (ITZO), or other metal oxide semiconductors.

11. The thin-film transistor substrate of claim 1 , wherein the semiconductor layer is amorphous silicon, polycrystalline silicon, or crystalline silicon.

12. The thin-film transistor substrate of claim 1 , wherein the semiconductor layer is an organic semiconductor of P13, DH4T, or pentanene.

13. A display device, comprising:

the thin-film transistor substrate of claim 1 ;

a counter substrate disposed over the thin-film transistor substrate; and

a display unit disposed between the thin-film transistor substrate and the counter substrates.

14. The display device of claim 13 , which is an organic light-emitting diode device (OLED) or a liquid crystal display (LCD).

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 18, 2024
From: INNOLUX CORPORATION
To: RED OAK INNOVATIONS LIMITED
Reel/Frame 069206/0903 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 2, 2015
From: SHEN, I-HO; CHANG, JUNG-FANG
To: INNOLUX CORPORATION
Reel/Frame 036709/0392 →