Control of resin curing
Systems and methods of treating a zone of a subterranean formation penetrated by a wellbore are described. A composition may include a first solution including at least one amine containing resin; and citraconic anhydride. The composition may also include a second solution mixed with the first solution, where the second solution includes at least one epoxide containing resin. Methods may include providing the treatment fluid to a subterranean formation.
1. A method of treating a zone of a subterranean formation penetrated by a wellbore, the method comprising:
(A) forming a treatment fluid comprising:
(i) a first solution comprising:
(a) at least one amine containing resin; and
(b) citraconic anhydride;
(ii) a second solution comprising at least one epoxide containing resin; and
(B) introducing the treatment fluid through the wellbore into the zone of the subterranean formation surrounding the wellbore.
2. The method of claim 1 , wherein the at least one amine containing resin is selected from the group consisting of: trimethoxy silyl propyl ethelene diamine, N-[3 (trimethoxysilyl)propyl]ethylenediamine], 3-aminopropyltriethoxysilane, 3-aminopropyltrimethoxysilane, 4-aminobutyltriethoxysilane, aminophenyltrimehtoxysilane, 3-aminopropyltris(methoxyethoxy-ethoxy)silane, 11-aminodecyltriethoxysilane, 2-(4-pyridylethyl)triethoxysilane, 3-aminopropyl diisopropylethoxysilane, 3-aminopropyl dimethylethoxysilane, N-(2-aminoethyl)-3-aminopropyl-triethoxysilane, N-(6-aminohexyl)aminomethyl-triethoxysilane, N-(6-aminohexyl)aminopropyl-trimethoxysilane, (3 trimethoxysilylpropyl)diethylene triamine, n butylaminopropyltrimethoxysilane, bis(2 hydroxyethyl)-3-aminopropyl-triethoxysilane, 3 (N styrylmethyl-2-aminoethylamino)propyltrimethoxysilane hydrochloride, and combinations thereof.
3. The method of claim 2 , wherein the at least one amine containing resin is trimethoxy silyl propyl ethelene diamine.
4. The method of claim 1 , wherein the first solution has a pH between approximately 8.0 and approximately 9.0.
5. The method of claim 4 , wherein the first solution has a pH of approximately 8.5.
6. The method of claim 1 , wherein citraconic anhydride is present in the first solution in an amount such that the pH of the first solution has a pH between approximately 8.0 and approximately 9.0.
7. The method of claim 1 , wherein the at least one epoxy containing resin is selected from the group consisting of: glycidoxy propyl trimethoxy silane, (3 glycidoxypropyl)trimethoxysilane, (3 glycidoxypropyl)triethoxysilane, 5,6 epoxyhexyltriethoxysilane, (3 glycidoxypropyl)methyldiethoxysilane, (3 glycidoxypropyl)methyldimethoxysilane, (3 glycidoxypropyl)dimethylethoxysilane, and combinations thereof.
8. The method of claim 7 , wherein the at least one epoxy containing resin is glycidoxy propyl trimethoxy silane.
9. The method of claim 1 , further comprising converting amide in the treatment fluid to amine by lowering pH by in-situ generation of weak acids.
10. The method of claim 1 , further comprising converting amide in the treatment fluid to amine by providing a pH adjusting fluid into the zone of the subterranean formation surrounding the wellbore.
11. The method of claim 1 , further comprising mixing the treatment fluid using mixing equipment.
12. The method of claim 1 , wherein the treatment fluid is introduced into the subterranean formation using one or more pumps.
13. A composition for treating a zone of a subterranean formation penetrated by a wellbore, the composition comprising:
(A) a first solution comprising:
(i) at least one amine containing resin; and
(ii) citraconic anhydride;
(B) a second solution mixed with the first solution, the second solution comprising at least one epoxide containing resin.
14. The composition of claim 13 , wherein the at least one amine containing resin is selected from the group consisting of: trimethoxy silyl propyl ethelene diamine, N-[3 (trimethoxysilyl)propyl]ethylenediamine], 3-aminopropyltriethoxysilane, 3-aminopropyltrimethoxysilane, 4-aminobutyltriethoxysilane, aminophenyltrimehtoxysilane, 3-aminopropyltris(methoxyethoxy-ethoxy)silane, 11-aminodecyltriethoxysilane, 2-(4-pyridylethyl)triethoxysilane, 3-aminopropyl diisopropylethoxysilane, 3-aminopropyl dimethylethoxysilane, N-(2-aminoethyl)-3-aminopropyl-triethoxysilane, N-(6-aminohexyl)aminomethyl-triethoxysilane, N-(6-aminohexyl)aminopropyl-trimethoxysilane, (3 trimethoxysilylpropyl)diethylene triamine, n butylaminopropyltrimethoxysilane, bis(2 hydroxyethyl)-3-aminopropyl-triethoxysilane, 3 (N styrylmethyl-2-aminoethylamino)propyltrimethoxysilane hydrochloride, and combinations thereof.
15. The composition of claim 14 , wherein the at least one amine containing resin is trimethoxy silyl propyl ethelene diamine.
16. The composition of claim 13 , wherein the first solution has a pH between approximately 8.0 and approximately 9.0.
17. The composition of claim 16 , wherein the first solution has a pH of approximately 8.5.
18. The composition of claim 13 , wherein citraconic anhydride is present in the first solution in an amount such that the pH of the first solution has a pH between approximately 8.0 and approximately 9.0.
19. The composition of claim 13 , wherein the at least one epoxy containing resin is selected from the group consisting of: glycidoxy propyl trimethoxy silane, (3 glycidoxypropyl)trimethoxysilane, (3 glycidoxypropyl)triethoxysilane, 5,6 epoxyhexyltriethoxysilane, (3 glycidoxypropyl)methyldiethoxysilane, (3 glycidoxypropyl)methyldimethoxysilane, (3 glycidoxypropyl)dimethylethoxysilane, and combinations thereof.
20. The composition of claim 19 , wherein the at least one epoxy containing resin is glycidoxy propyl trimethoxy silane.