Formulations comprising hydridosilanes and hydridosilane oligomers, their process of manufacture and their use
The present invention relates to formulations comprising at least one hydridosilane of the generic formula Si n H 2n+2 with n=7-10 and at least one hydridosilane oligomer, to processes for preparation thereof and to the use thereof.
1. A formulation, comprising:
at least one hydridosilane, and
at least one hydridosilane oligomer, wherein the at least one hydridosilane has a generic formula Si n H 2n+2 with n ranging from 7-10,
wherein a proportion of the at least one hydridosilane is 0.1 to 60% by weight and a proportion of the at least one hydridosilane oligomer is from 40 to 99.9% by weight, each based on the total mass of said at least one hydridosilane and said at least one hydridosilane oligomer,
wherein the at least one hydridosilane oligomer has a weight-average molecular weight of 200 g/mol to 10 000 g/mol.
2. The formulation according to claim 1 , wherein the at least one hydridosilane is an octasilane isomer or a nonasilane isomer.
3. The formulation according to claim 1 , wherein the at least one hydridosilane is a branched hydridosilane.
4. The formulation according to claim 1 , wherein the at least one hydridosilane oligomer is obtained by a process comprising oligomerizing noncyclic hydridosilanes.
5. The formulation according to claim 4 , wherein the at least one hydridosilane oligomer is obtained by a process comprising converting thermally a composition comprising a noncyclic hydridosilane comprising not more than 20 silicon atoms, in the absence of a catalyst at a temperature of less than 235° C.
6. The formulation according to claim 1 , wherein the at least one hydridosilane oligomer comprises carbon.
7. The formulation according to claim 1 , wherein the at least one hydridosilane oligomer is doped.
8. The formulation according to claim 1 , wherein a proportion of the at least one hydridosilane is in a range of 1% to 40% by weight based on the total mass of the formulation.
9. The formulation according to claim 1 , wherein a proportion of the at least one hydridosilane oligomer is in a range of 1% to 60% by weight based on the total mass of the formulation.
10. The formulation according to claim 1 , wherein the formulation comprises a solvent.
11. The formulation according to claim 10 , wherein a proportion of the solvent is in a range of 25% to 95% by weight based on the total mass of the formulation.
12. The formulation according to claim 10 , wherein the formulation comprises: 1-30% by weight of at least one hydridosilane, 10-40% by weight of at least one hydridosilane oligomer and 50-85% by weight of solvent, based on the total mass of the formulation.
13. A process for preparing a formulation according to claim 1 , the process comprising:
mixing the at least one hydridosilane with the at least one hydridosilane oligomer and optionally a solvent.
14. A method for producing layers comprising silicon, the method comprising:
applying the formulation according to claim 1 to a substrate.
15. A method for producing electronic or optoelectronic layers, the method comprising:
applying the formulation according to claim 1 to a substrate.
16. A method for producing electronic or optoelectronic components, the method comprising:
applying the formulation according to claim 1 to a substrate.
17. The formulation according to claim 1 , further comprising a solvent in an amount of 0.1 to 99 wt. %, based on a total mass of said formulation.
18. The formulation according to claim 1 , further comprising a solvent in an amount of 25 to 99 wt. %, based on a total mass of said formulation.
19. The formulation according to claim 1 , further comprising a solvent in an amount of 60 to 95 wt. %, based on a total mass of said formulation.