Adaptive vapor barrier

1. A method for manufacturing an ambient humidity adaptive water vapor barrier, the method comprising

preparing a film, a textile or a layer of material P, said material P comprising at least one copolymer A which is a polyamide represented by PAXY/XAIS M n+ 1/n or represented by PAZ/XAISM n+ 1/n ,

in which

X, Y and Z represent, independently of one another, integers ranging from 3 to 36,

M n+ 1/n , with n representing the number of charges of M, and M representing Li + , Na + , K + , Ag + , Cu + , Cu 2+ Zn 2+ , Mn 2+ , Mg 2+ , Fe 2+ , Fe 3+ , Al 3+ , NH 4+ , and/or phosphonium, and

AIS represents a residue derived from 5-sulfoisophthalic acid; and

combining the film, textile or layer of material P with a solid support selected from the group consisting of reinforced or non-reinforced concrete, bricks, metal, cellular glass, metal sheets, and glass; wherein the film, textile or layer of material P, has a water vapor permeability:

less than or equal to 0.25 g·mm/m 2 ·J, at 23° C. and at an average humidity level of 25%, and/or

greater than or equal to 3 g·mm/m 2 ·J, at 23° C. and at an average humidity level of 75%.

2. The method according to claim 1 , wherein the film, textile or layer of material P, has a (water vapor permeability at 23° C. and at an average humidity level of 75%)/(water vapor permeability at 23° C. and at an average humidity level of 25%) ratio greater than or equal to 15.

3. The method according to claim 2 , wherein the film, textile or layer of material P, has a (water vapor permeability at 23° C. and at an average humidity level of 75%)/(water vapor permeability at 23° C. and at an average humidity level of 25%) ratio greater than or equal to 35.

4. The method according to claim 1 , wherein the copolymer A is obtained by polymerization:

of a diamine selected from the group consisting of 1,4-diaminobutane, 1,5-diaminopentane, 1,6-diaminohexane or hexamethylenediamine (HMD), 2-methylpentamethylenediamine, 2-methylhexamethylenediamine, 3-methylhexamethylenediamine, 2,5-dimethylhexamethylenediamine, 2,2-dimethylpentamethylenediamine, 1,8-diaminooctane, methyl-1,8-diaminooctane, 1,9-diaminononane, 5-methylnonanediamine, 1,10-diaminodecane or decamethylenediamine, 1,12-diaminododecane, or dodecamethylenediamine, and N-(6-aminohexyl)-N-methyl-1,6-hexanediamine,

of a diacid selected from the group consisting of oxalic acid, succinic acid (HOOC—(CH 2 ) 2 —COOH), glutaric acid (HOOC—(CH 2 ) 3 —COOH), 2-methylglutaric acid (HOOC—CH(CH 3 )—(CH 2 ) 2 —COOH), 2,2-dimethylglutaric acid (HOOC—C(CH 3 ) 2 —(CH 2 ) 2 —COOH), adipic acid (HOOC—(CH 2 ) 4 —COOH), 2,4,4-trimethyladipic acid (HOOC—CH(CH 3 )—CH 2 —C(CH 3 ) 2 —CH 2 —COOH), pimelic acid (HOOC—(CH 2 ) 5 —COOH), suberic acid (HOOC—(CH 2 ) 6 —COOH), azelaic acid (HOOC—(CH 2 ) 7 —COOH), sebacic acid (HOOC—(CH 2 ) 8 —COOH), undecanedioic acid (HOOC—(CH 2 ) 9 —COOH), dodecanedioic acid (HOOC—(CH 2 ) 10 —COOH), terephthalic acid and isophthalic acid, and

of 5-sulfoisophthalic acid of lithium, sodium, potassium, silver, copper I or II, zinc, manganese, magnesium, iron II or III, ammonium or phosphonium.

5. The method according to claim 1 , wherein the copolymer A is obtained by polymerization:

of a diamine selected from the group consisting of 1,4-diaminobutane, 1,5-diaminopentane, 1,6-diaminohexane or hexamethylenediamine (HMD), 2-methylpentamethylenediamine, 2-methylhexamethylenediamine, 3-methylhexamethylenediamine, 2,5-dimethylhexamethylenediamine, 2,2-dimethylpentamethylenediamine, 1,8-diaminooctane, methyl-1,8-diaminooctane, 1,9-diaminononane, 5-methylnonanediamine, 1,10-diaminodecane or decamethylenediamine, 1,12-diaminododecane, or dodecamethylenediamine, and N-(6-aminohexyl)-N-methyl-1,6-hexanediamine,

of an amino acid or a lactam selected from the group consisting of caprolactam, 6-aminohexanoic acid, 10-aminodecanoic acid, 11-aminoundecanoic acid and 12-dodecanolactam, and

of 5-sulfoisophthalic acid of lithium, sodium, potassium, silver, copper I or II, zinc, manganese, magnesium, iron II or III, ammonium or phosphonium.

6. The method according to claim 1 , wherein the copolymer A comprises PA66/6AISLi and/or PA66/6AISNa.

7. The method according to claim 1 , wherein the copolymer A comprises a content of aromatic repeat unit ranging from 0.1 to 60 mol %, relative to the total number of repeat units in the polyamide.

8. The method according to claim 1 , wherein the material P further comprises at least one other polymer, in this case the polyamide constitutes a continuous phase.

9. The method according to claim 1 , wherein the material P comprises at least one impact modifier, i.e. a compound capable of modifying the impact strength of a polyamide composition.

10. The method according to claim 1 , wherein the material P further comprises pigments, mineral or organic fillers, matting agents, heat-, light- and/or UV-stabilizers, lubricants, plasticizers or flame retardants.

11. The method according to claim 1 , wherein the film of material P has a thickness ranging from 10 to 500 μm, the layer of material P has a thickness ranging from 1 to 500 μm or the textile of material P has a thickness ranging from 50 μm to 2 mm.

12. The method according to claim 1 , wherein X, Y and Z represent, independently of one another, integers ranging from 4 to 18.

13. The method according to claim 1 , wherein X, Y and Z represent, independently of one another, integers ranging from 4 to 12.

14. The method according to claim 1 , wherein M represents Li + and/or Na + .

15. A construction element comprising at least one film, one textile or one layer of material P and at least one construction material suitable for producing wall or roof structures selected from the group consisting of reinforced or non-reinforced concrete, bricks, metal, cellular glass, metal sheets, and glass;

wherein said material P comprises at least one copolymer A which is a polyamide represented by PAXY/XAIS M n+ 1/n or represented by PAZ/XAISM n+ 1/n ,

in which

X, Y and Z represent, independently of one another, integers ranging from 3 to 36,

M n+ 1/n , with n representing the number of charges of M, and M representing Li + , Na + , K + , Ag + , Cu + , Cu 2+ Zn 2+ , Mn 2+ , Mg 2− , Fe 2+ , Fe 3+ , Al 3+ , NH 4+ , and/or phosphonium, and

AIS represents a residue derived from 5-sulfoisophthalic acid.