Laminate and manufacturing method therefor

1. A laminate, comprising:

a substrate;

a transparent conducting layer provided on the substrate;

a first layer provided on the transparent conducting layer;

a second layer which is provided on and in contact with the first layer and has an overhang structure with a width which is larger than that of the first layer; and

a conductive layer which is provided on the substrate and the second layer,

wherein the conductive layer provided on the substrate is electrically shorted from the conductive layer provided on the second layer,

wherein the conductive layer provided on the substrate and the conductive layer provided on the second layer are spaced apart from each other,

wherein the second layer and the transparent conducting layer are spaced apart,

wherein the transparent conducting layer is an anode electrode, the first layer is an auxiliary electrode of the anode electrode, and the conductive layer provided on the second layer is a cathode electrode,

wherein the second layer is an insulating layer, and

wherein the auxiliary electrode is connected with the anode electrode.

2. The laminate of claim 1 , wherein the conductive layer provided on the substrate is electrically shorted from the first layer.

3. The laminate of claim 1 , wherein the conductive layer provided on the substrate is electrically shorted from the second layer.

4. The laminate of claim 1 , wherein the first layer and the second layer comprise materials whose etching speeds by the same etchant are different from each other.

5. The laminate of claim 1 , wherein types of etchants which are used to form the first layer and the second layer are different from each other.

6. The laminate of claim 4 , wherein the etchant comprises one or more selected from a group consisting of hydrofluoric acid (HF), phosphoric acid (H 3 PO 4 ), a buffered oxide etchant (BOE), a buffered HF solution (BHF), hydrogen peroxide based etchants, CH 3 COOH, HCl, HNO 3 , and ferric based etchants.

7. The laminate of claim 1 , wherein the first metal layer comprises one or more selected from a group consisting of magnesium, calcium, sodium, potassium, titanium, indium, lithium, gadolinium, aluminum, silver, tin, lead, chrome, molybdenum, copper, and an alloy thoseof.

8. The laminate of claim 1 , wherein the insulating layer comprises one or more selected from a group consisting of a photoresist material; polyimide; polyacryl; silicon nitride; silicon oxide; aluminum oxide; aluminum nitride; an alkali metal oxide; and an alkaline earth metal oxide.

9. The laminate of claim 1 , wherein the conductive layer comprises at least one oxide selected from indium (In), tin (Sn), zinc (Zn), gallium (Ga), cerium (Ce), cadmium (Cd), magnesium (Mg), beryllium (Be), silver (Ag), molybdenum (Mo), vanadium (V), copper (Cu), iridium (Ir), rhodium (Rh), ruthenium (Ru), tungsten (W), cobalt (Co), nickel (Ni), manganese (Mn), aluminum (Al) and lanthanum (La).

10. The laminate of claim 1 , wherein the conductive layer comprises one or more selected from a group consisting of magnesium, calcium, sodium, potassium, titanium, indium, yttrium, lithium, gadolinium, aluminum, silver, platinum, gold, tungsten, tantalum, copper, tin, lead, and an alloy thoseof.

11. An electrode, comprising: a laminate of claim 1 .

12. The laminate of claim 1 , wherein the transparent conducting layer is provided between the substrate and the first layer, and between the substrate and the conducting layer provided on the substrate, and

wherein the transparent conducting layer provided between the substrate and the first layer and the transparent conducting layer provided between the substrate and the conducting layer are space apart.

13. A laminate, comprising:

a substrate;

a transparent conducting layer provided on the substrate;

a first layer provided on the transparent conducting layer;

a second layer which is provided on and in contact with the first layer and has an overhang structure with a width which is larger than that of the first layer; and

a conductive layer which is provided on the substrate and the second layer,

wherein the conductive layer provided on the substrate is electrically shorted from the conductive layer provided on the second layer,

wherein the first layer is in contact with the transparent conducting layer and the second layer,

wherein the second layer and the transparent conducting layer are spaced apart by the first layer,

wherein the transparent conducting layer is an anode electrode, the first layer is an auxiliary electrode of the anode electrode, and the conductive layer provided on the second layer is a cathode electrode,

wherein the second layer is an insulating layer, and

wherein the auxiliary electrode is connected with the anode electrode.

14. A method for preparing a laminate, comprising:

1) forming a transparent conducting layer on a substrate;

2) forming a first layer including a metal material on the transparent conducting layer, the first layer being connected with the transparent conducting layer;

3) forming a second layer on and in contact with the first layer, the second layer having an overhang structure whose width is larger than that of the first layer; and

4) forming conductive layers on the substrate and the second layer, the conductive layer provided on the substrate being electrically shorted from the conductive layer provided on the second layer,

wherein the transparent conducting layer is an anode electrode, the first layer is an auxiliary electrode of the anode electrode, and the conductive layer provided on the second layer is a cathode electrode,

wherein the overhang structure in step 3) is formed by simultaneously etching the first layer and the second layer, and

wherein the second layer includes an insulating material whose etching speed by a same etchant is lower than that of the metal material of the first layer.