Deposition of discrete nanoparticles on a nanostructured surface of an implant
View Patent ↗A method of forming an implant to be implanted into living bone is disclosed. The method comprises the act of roughening at least a portion of the implant surface to produce a microscale roughened surface. The method further comprises forming a nanoscale roughened surface on the microscale roughened surface. The method further comprises the act of depositing discrete nanoparticles on the nanoscale roughened surface though a one-step process of exposing the roughened surface to a solution including the nanoparticles. The nanoparticles comprise a material having a property that promotes osseointegration.
1. A method of forming an implant to be implanted into living bone, the method, comprising:
roughening at least a portion of an implant surface to produce a microscale roughened surface;
forming permanent nanostructures on the microscale roughened surface; and
depositing discrete nanoparticles on the permanent nanostructures through a one-step process of exposing the permanent nanostructures to a solution including the nanoparticles, the nanoparticles comprising a material having a property that promotes osseointegration.
2. The method of claim 1 , wherein the implant is made of a metal selected from the group consisting of tantalum, cobalt, chromium, titanium, stainless steel, and alloys thereof.
3. The method of claim 1 , wherein the nanostructures are made from a same material as the implant.
4. The method of claim 1 , wherein the implant is a dental implant.
5. The method of claim 4 , wherein the portion of the implant surface is a threaded bottom portion for facilitating bonding with bone.
6. The method of claim 1 , wherein the implant is made of titanium and the act of roughening the implant surface to produce a microscale roughened surface comprises:
removing a native oxide layer from the implant surface; and
acid etching the resulting surface.
7. The method of claim 1 , wherein the act of roughening the implant surface to produce a microscale roughened surface creates irregularities, the irregularities having peak-to-valley heights not greater than about 20 microns.
8. The method of claim 1 , wherein the nanoparticles include hydroxyapatite nanoparticles.
9. The method of claim 1 , wherein a portion of the microscale roughened surface is exposed through the nanoparticles such that the exposed portion of the microscale roughened surface is for contacting bone.
10. A method of forming an implant to be implanted into living bone, the method, comprising:
roughening at least a portion of an implant surface to produce a microscale roughened surface;
forming permanent nanostructures on the microscale roughened surface, wherein the permanent nanostructures have a first nanotopography; and
depositing discrete nanoparticles on portions of the permanent nanostructures through a one-step process, wherein the discrete nanoparticles form a second nanotopography on the first nanotopography.
11. The method of claim 10 , wherein a portion of the first nanotopography is exposed through the second nanotopography such that the exposed portion of the first nanotopography is for contacting bone.
12. The method of claim 10 , wherein the nanoparticles include a material having a property that promotes osseointegration.
13. The method of claim 12 , wherein the discrete nanoparticles include hydroxyapatite nanoparticles.
14. The method of claim 13 , wherein the discrete hydroxyapatite nanoparticles are deposited by exposing the implant to a solution including the hydroxyapatite nanoparticles.
15. The method of claim 13 , wherein the hydroxyapatite nanoparticles include hydroxyapatite nanocrystals.
16. The method of claim 15 , wherein the hydroxyapatite nanocrystals have dimensions of about 20 nanometers to about 100 nanometers.
17. The method of claim 10 , wherein roughening at least a portion of an implant surface to produce a microscale roughened surface, includes:
removing a native oxide layer from the implant surface; and
acid etching the resulting surface.
18. The method of claim 17 , wherein roughening at least a portion of an implant surface to produce a microscale roughened surface includes grit blasting.
19. The method of claim 17 , wherein roughening at least a portion of an implant surface to produce a microscale roughened surface includes titanium plasma spraying.
20. The method of claim 10 , wherein the microscale roughened surface includes an array of microscale irregularities having peak-to-valley heights not greater than about 20 microns.