Preparation of lacing resistant, titanium dioxide particles for use in photodurable thin film production
View Patent ↗A process is provided for the preparation of lacing resistant, titanium dioxide particles for use in photodurable thin film production. Said process involves dewatering titanium dioxide particles that have been encapsulated with a layer of amorphous alumina in continuous fashion at temperatures in excess of 100° C.
1. A method of making lacing resistant titanium dioxide particles comprising the steps of:
a) providing titanium dioxide particles encapsulated with amorphous alumina; and
b) heating the titanium dioxide particles encapsulated with amorphous alumina to a temperature of from about 200° C. to about 500° C. to form dewatered titanium dioxide particles encapsulated with amorphous alumina having a moisture content of about 0.65 weight percent or less on a total particle basis.
2. The method of claim 1 comprising a further step of:
c) treating the surface of the dewatered titanium dioxide particles encapsulated with amorphous alumina with an organic compound.
3. The method of claim 2 wherein the organic compound is selected from the group consisting of low molecular weight polyols, organosiloxanes, organosilanes, alkylcarboxylic acids, alkylsulfonates, organophosphates, organophosphonates and mixtures thereof.
4. The method of claim 3 wherein the organic compound is selected from the group consisting of low molecular weight polyols, organosiloxanes, organosilanes and organophosphonates and mixtures thereof.
5. The method of claim 3 wherein the organic compound is present at a loading of between 0.20 wt % and 2.00 wt % on a total particle basis.
6. The method of claim 1 wherein the dewatered titanium dioxide particles encapsulated with amorphous alumina have a moisture content of about 0.55 weight percent or less on a total particle basis.
7. The method of claim 6 wherein the dewatered titanium dioxide particles encapsulated with amorphous alumina have a moisture content of about 0.50 weight percent or less on a total particle basis.