Process for producing hollow silicon bodies
View Patent ↗Hollow bodies having a silicon-comprising shell, are produced by, in a gas comprising at least one silane of the general formula Si n H 2n+2−m X m with n=1 to 4, m=0 to 2n+2 and X=halogen, (a) generating a non-thermal plasma by an AC voltage of frequency f, or operating a light arc, or introducing electromagnetic energy in the infrared region into the gas, giving a resulting phase which (b) is dispersed in a wetting agent and distilled, and then (c) the distillate is contacted at least once with a mixture of at least two of the substances hydrofluoric acid, nitric acid, water, giving a solid residue comprising hollow bodies having a silicon-comprising shell after the conversion reaction of the distillate with the mixture has abated or ended.
1. A process for producing a hollow body comprising a silicon-comprising shell, said process comprising:
in a gas comprising a silane of formula Si n H 2n+2−m X m with n=1 to 4, m=0 to 2n+2 and X=halogen,
(a) producing a resultant phase by generating a non-thermal plasma by an AC voltage of frequency f, or operating a light arc, or introducing electromagnetic energy in an infrared region into the gas,
(b) dispersing the resultant phase in a wetting agent and distilling the dispersed resultant phase, thereby forming a distillate,
(c) carrying out a conversion reaction by contacting the distillate at least once with a mixture comprising at least two substances selected from the group consisting of hydrofluoric acid, nitric acid, and water, and
(d) abating or ending the conversion reaction of the distillate with the mixture, thereby forming a solid residue comprising the hollow body having a silicon-comprising shell after the conversion reaction of the distillate with the mixture has abated or ended.
2. The process according to claim 1 , wherein the producing is carried out in a plasma reactor, induction reactor, pyrolysis furnace or light arc furnace, and
an interior which is a reaction space of the plasma reactor, induction reactor, pyrolysis furnace or light arc furnace comprises glass, oxide ceramic, carbide ceramic or graphite.
3. The process according to claim 1 , further comprising degassing the resultant phase prior to the dispersing the resultant phase in the wetting agent,
wherein the wetting agent is at least one selected from the group consisting of water and ethanol.
4. The process according to claim 1 , wherein the carrying out the conversion reaction comprises first contacting the distillate with a mixture of water and nitric acid and then with hydrofluoric acid, giving said solid residue and
the process further comprises, after the abating of the conversion reaction, washing, filtering and/or drying the solid residue.
5. The process according to claim 1 , further comprising:
washing, filtering and/or drying the solid residue.
6. The process according to claim 1 , further comprising:
washing, filtering and/or drying the solid residue after the ending the conversion reaction.
7. The process according to claim 1 , wherein, in (a), the non-thermal plasma is generated by the AC voltage of frequency f.
8. The process according to claim 1 , wherein, in (a), the light arc is operated.
9. The process according to claim 1 , wherein, in (a), the electromagnetic energy in the infrared region is introduced into the gas.
10. The process according to claim 1 , wherein the gas comprises monosilane.
11. The process according to claim 1 , wherein the silane comprises a boron content of about 1 ppt to 10 ppm and a phosphorus content of about 1 ppt to 10 ppm.
12. The process according to claim 6 , wherein the conversion reaction is ended by adding water.