IP Library Granted Patent US 9,796,922
Granted Patent B2
US 9,796,922 · App. 14/966,610 · Granted Oct 24, 2017

Method of forming a scintillation crystal including a rare earth halide

Inventors: Peter R. Menge (Novelty, OH); Vladimir Ouspenski (Saint-Pierre-les-Nemours, FR)
Assignee: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
C09K11/7772C04B35/5152C04B35/553C09K11/7773C30B11/04C30B15/04C30B29/12G01T1/202G01T1/2018G21K4/00C04B2235/3206C04B2235/3213C04B2235/3215C04B2235/3224C04B2235/3227C04B2235/3229C04B2235/3284C04B2235/9646
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Quick Facts
Patent No.
US 9,796,922
App. No.
14/966,610
Granted
Oct 24, 2017
Kind
B2
Abstract

A scintillation crystal can include Ln (1-y) RE y X 3 , wherein Ln represents a rare earth element, RE represents a different rare earth element, y has a value in a range of 0 to 1, and X represents a halogen. In an embodiment, RE is Ce, and the scintillation crystal is doped with Sr, Ba, or a mixture thereof at a concentration of at least approximately 0.0002 wt. %. In another embodiment, the scintillation crystal can have unexpectedly improved linearity and unexpectedly improved energy resolution properties. In a further embodiment, a radiation detection system can include the scintillation crystal, a photosensor, and an electronics device. Such a radiation detection system can be useful in a variety of radiation imaging applications.

Claims (122)

1. A method, comprising:

placing into a crucible precursors including:

a rare earth halide precursor; and

a dopant precursor that includes a strontium halide, a barium halide, or any combination thereof;

melting the precursors to form a melt;

contacting the melt with a seed crystal;

using the seed crystal to form a scintillation crystal from the melt, wherein the scintillation crystal comprises La (1-y) RE y X 3 :Me 2+ , wherein:

RE represents a rare earth element other than La;

y has a value in a range of 0 to 0.5;

X represents a halogen; and

Me 2+ represents Sr, Ba, or any mixture thereof and has a concentration in a range of 0.0002 wt. % to 0.05 wt. %; and

roughening a surface of the scintillation crystal.

2. A method, comprising:

placing into a crucible precursors including:

a rare earth halide precursor; and

a dopant precursor that includes a strontium halide, a barium halide, or any combination thereof;

melting the precursors to form a melt;

contacting the melt with a seed crystal; and

using the seed crystal to form a scintillation crystal from the melt, wherein the scintillation crystal comprises La (1-y) RE y X 3 :Me 2+ , wherein:

RE represents a rare earth element other than La;

y has a value in a range of 0 to 0.5;

X represents a halogen; and

Me 2+ represents Sr, Ba, or any mixture thereof and has a concentration in a range of 0.0002 wt. % to 0.05 wt. %.

3. The method of claim 2 , wherein the scintillation crystal has a property including:

for a radiation energy range of 60 keV to 356 keV, the scintillation crystal has an average value for a departure from perfect linearity of no less than −0.35%;

for a radiation energy range of 2000 keV to 2600 keV, the scintillation crystal has an average value for a departure from perfect linearity of no greater than 0.07%;

for a radiation energy range of 60 keV to 356 keV, the scintillation crystal has an absolute value for a furthest departure from perfect linearity of no greater than 0.7%; or

any combination thereof.

4. The method of claim 3 , wherein the average value for the departure from perfect linearity (DFPL average ) is determined by:

DFPL

average

=

E

lower

E

upper

DFPL

(

E

i

)

·

E

i

E

upper

-

E

lower

,

where

DFPL(Ei) is DFPL at energy E i ;

E upper is the upper limit of the energy range; and

E lower is the lower limit of the energy range.

5. The method of claim 2 , wherein the concentrations of Me 2+ is no greater than 0.03 wt. %.

6. The method of claim 5 , wherein y has a value in a range of 0.0001 to 0.2.

7. The method of claim 2 , wherein RE is Ce.

8. The method of claim 7 , wherein y has a value in a range of 0.0001 to 0.2.

9. The method of claim 2 , wherein Me 2+ represents Sr.

10. The method of claim 2 , wherein Me 2+ represents Ba.

11. The method of claim 2 , wherein Me 2+ does not include any divalent metal element other than Sr, Ba, or any combination thereof.

12. The method of claim 2 , wherein the concentration of Me 2+ is in a range of 0.005 wt. % to 0.02 wt. %.

13. The method of claim 2 , further comprising placing the scintillation crystal within casing.

14. The method of claim 13 , placing an optical interface adjacent to a surface of the scintillation crystal.

15. The method of claim 14 , further comprising placing a photosensor adjacent to the optical interface, wherein the optical interface is disposed between and optically couples the scintillation crystal and the photosensor to each other.

16. A method, comprising:

placing into a crucible precursors including:

LaBr 3 ;

CeBr 3 ; and

a dopant precursor that includes SrBr 2 , BaBr 2 , or any combination thereof;

melting the precursors to form a melt;

contacting the melt with a seed crystal; and

pulling a scintillation crystal from the melt, wherein the scintillation crystal comprises wherein the scintillation crystal comprises La (1-y) Ce y Br 3 :Me 2+ ,

wherein:

y has a value in a range of approximately 0.001 to 0.2; and

Me 2+ represents Sr, Ba, or any mixture thereof and has a concentration in a range of 0.0002 wt. % to 0.05 wt. %.

17. The method of claim 16 , wherein the scintillation crystal has a property including:

for a radiation energy range of 60 keV to 356 keV, the scintillation crystal has an average value for a departure from perfect linearity of no less than −0.35%;

for a radiation energy range of 2000 keV to 2600 keV, the scintillation crystal has an average value for a departure from perfect linearity of no greater than 0.07%;

for a radiation energy range of 60 keV to 356 keV, the scintillation crystal has an absolute value for a furthest departure from perfect linearity of no greater than 0.7%; or

any combination thereof.

18. The method of claim 17 , wherein the average value for the departure from perfect linearity (DFPL average ) is determined by:

DFPL

average

=

E

lower

E

upper

DFPL

(

E

i

)

·

E

i

E

upper

-

E

lower

,

where

DFPL(Ei) is DFPL at energy E i ;

E upper is the upper limit of the energy range; and

E lower is the lower limit of the energy range.

19. The method of claim 16 , wherein the concentration of Me 2+ is in a range of 0.005 wt. % to 0.009 wt. %.

20. The method of claim 16 , further comprising roughening a surface of the scintillation crystal.

Assignments (3)
INTELLECTUAL PROPERTY SECURITY AGREEMENT SUPPLEMENT Recorded May 8, 2026
From: LUXIUM SOLUTIONS, LLC
To: GOLUB CAPITAL MARKETS LLC, AS COLLATERAL AGENT
Reel/Frame 075574/0443 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 18, 2023
From: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
To: LUXIUM SOLUTIONS, LLC
Reel/Frame 062419/0232 →
SECURITY INTEREST Recorded Dec 2, 2022
From: LUXIUM SOLUTIONS, LLC
To: KEYBANK NATIONAL ASSOCIATION, AS ADMINISTRATIVE AGENT
Reel/Frame 062049/0300 →
Continuity (3)
Continuation 13488756 · Jun 5, 2012
Provisional Application 61493805 · Jun 6, 2011
Related Publication 20160122639A1 · May 5, 2016