Photovoltaic device including a back contact and method of manufacturing
View Patent ↗A photovoltaic device includes a substrate, a transparent conductive oxide, an n-type window layer, a p-type absorber layer and an electron reflector layer. The electron reflector layer may include zinc telluride doped with copper telluride, zinc telluride alloyed with copper telluride, or a bilayer of multiple layers containing zinc, copper, cadmium and tellurium in various compositions. A process for manufacturing a photovoltaic device includes forming a layer over a substrate by at least one of sputtering, evaporation deposition, CVD, chemical bath deposition process, and vapor transport deposition process. The process includes forming an electron reflector layer over a p-type absorber layer.
1. A photovoltaic device comprising:
a p-type absorber layer;
an electron reflector layer over the p-type absorber layer, wherein the electron reflector layer consists of a first sublayer and a second sublayer, and wherein:
the first sublayer is adjacent the absorber layer and comprises cadmium zinc telluride, and
the second sublayer comprises zinc telluride doped with elemental copper; and
a back electrode over the electron reflector layer, wherein the back electrode layer comprises electrically conductive material.
2. A process for manufacturing the photovoltaic device of claim 1 , comprising the steps of:
forming the electron reflector layer over the p-type absorber layer; and
activating the photovoltaic device by applying a thermal treatment.
3. The process of claim 2 , wherein the step of forming an electron reflector layer is performed by sequentially forming the first sublayer and the second sublayer.
4. The photovoltaic device of claim 1 , wherein the p-type absorber layer comprises cadmium and tellurium.
5. The photovoltaic device of claim 4 , wherein the p-type absorber is doped with copper.
6. The photovoltaic device of claim 1 , comprising a buffer layer over a transparent conductive oxide layer, wherein the absorber layer is between the buffer layer and the back contact layer.
7. The photovoltaic device of claim 6 , wherein the transparent conductive oxide layer comprises tin oxide, zinc oxide, indium gallium oxide, cadmium stannate, cadmium tin oxide, cadmium indium oxide, fluorine doped tin oxide, aluminum doped zinc oxide, or indium tin oxide, doped variations thereof, or combinations thereof.
8. The photovoltaic device of claim 6 , wherein the buffer layer comprises tin oxide, zinc tin oxide, zinc oxide, zinc oxysulfide, or zinc magnesium oxide.
9. The photovoltaic device of claim 6 , comprising a barrier layer, wherein the transparent conductive oxide layer is over the barrier layer.
10. The photovoltaic device of claim 1 , wherein the back electrode layer comprises molybdenum nitride, chromium nitride, silver, nickel, copper, aluminum, titanium, palladium, chrome, molybdenum, gold, or combinations thereof.
11. The photovoltaic device of claim 1 , wherein the cadmium zinc telluride has a composition of Cd (1-x) Zn x Te wherein x is between about 0.30 to about 0.70.
12. The photovoltaic device of claim 9 , wherein the barrier layer comprises silicon nitride, silicon oxide, aluminum-doped silicon oxide, boron-doped silicon nitride, phosphorus-doped silicon nitride, silicon oxide-nitride, combinations thereof, or alloys thereof.