Photovoltaic devices including doped semiconductor films

1. A method for forming an absorber layer of a photovoltaic cell comprising:

vaporizing a source material to form a semiconductor vapor with a vapor transport deposition system having a distributor;

distributing the semiconductor vapor via the distributor to a deposition chamber, wherein the semiconductor vapor comprises Cd and Te;

applying excess Cd or Te to the semiconductor vapor, whereby:

the vapor is off-stoichiometric compared to CdTe, and

a vapor phase overpressure of Cd or Te is introduced to the semiconductor vapor;

controlling vacancy concentration in the absorber layer using the vapor phase overpressure; and

introducing a P-type dopant into the absorber layer at a concentration greater than 0.5 ppma.

2. The method of claim 1 , wherein the P-type dopant is introduced by diffusion.

3. The method of claim 1 , wherein the P-type dopant is introduced by a vapor.

4. The method of claim 3 , wherein the P-type dopant comprises P, As, Sb, Na, K, or Rb.

5. The method of claim 1 , wherein the P-type dopant is introduced as a mixed powder.

6. The method of claim 1 , wherein the P-type dopant is introduced as a solid powder.

7. The method of claim 1 , wherein the P-type dopant is introduced throughout the absorber layer.

8. The method of claim 1 , wherein the P-type dopant is added to a portion of the absorber layer.

9. The method of claim 1 , wherein the P-type dopant is introduced during heat treatment.

10. The method of claim 9 , wherein the heat treatment temperature is about 400 degrees Celsius.

11. The method of claim 9 , wherein the P-type dopant is applied to a surface of the absorber layer prior to heat treatment.

12. The method of claim 9 , comprising applying a flux solution to a surface of the absorber layer prior to heat treatment, wherein the flux solution comprises CdCl 2 .

13. The method of claim 12 , comprising adding Group I and Group V species to the flux solution.

14. The method of claim 1 , wherein the source material comprises a CdTe source powder and excess Cd powder or Te powder.

15. The method of claim 1 , wherein the source material comprises a two-phase powder blend.

16. The method of claim 1 , wherein the source material comprises an off-stoichiometric source material.

17. The method of claim 1 , wherein the P-type dopant comprises N, P, As, Sb, or Bi.

18. The method of claim 1 , wherein the P-type dopant comprises Li, Na, K, Rb, Cs, Cu, Ag, or Au.

19. The method of claim 1 , wherein the absorber layer comprises a mixture of CdTe and at least one semiconductor selected from the group consisting of ZnO, ZnS, ZnSe, ZnTe, CdO, CdS, CdSe, MgO, MgS, MgSe, MgTe, HgO, HgS, HgSe, HgTe, MnO, MnS, MnTe, AlN, AlP, AlAs, AlSb, GaN, GaP, GaAs, GaSb, InN, InP, InAs, InSb, TlN, TlP, TlAs, and TlSb.

20. A method for forming an absorber layer of a photovoltaic cell comprising:

depositing the absorber layer, wherein the absorber layer comprises a mixture of CdTe and at least one semiconductor selected from the group consisting of ZnO, ZnS, ZnSe, ZnTe, CdO, CdS, CdSe, MgO, MgS, MgSe, MgTe, HgO, HgS, HgSe, HgTe, MnO, MnS, MnTe, AlN, AlP, AlAs, AlSb, GaN, GaP, GaAs, GaSb, InN, InP, InAs, InSb, TlN, TlP, TlAs, and TlSb;

applying a flux solution to a surface of the absorber layer, wherein the flux solution comprises CdCl 2 and a chloride compound, and wherein the chloride compound comprises a Group I element, a Group V element, or both;

heat treating the absorber layer with the flux solution; and

introducing a P-type dopant into the absorber layer at a concentration greater than 0.5 ppma.