IP Library Granted Patent US 10,875,153
Granted Patent B2
US 10,875,153 · App. 15/002,384 · Granted Dec 29, 2020

Advanced polishing pad materials and formulations

Inventors: Rajeev Bajaj (Fremont, CA); Daniel Redfield (Morgan Hill, CA); Mahendra C. Orilall (Santa Clara, CA); Boyi Fu (San Jose, CA); Ashwin Chockalingam (San Jose, CA)
Assignee: APPLIED MATERIALS, INC.
B24D11/001B24B37/22B24B37/24B24B37/26B24D3/28B24D11/04B33Y10/00B33Y70/00B33Y80/00
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Quick Facts
Patent No.
US 10,875,153
App. No.
15/002,384
Granted
Dec 29, 2020
Kind
B2
Abstract

Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.

Claims (49)

1. A method of forming a polishing article, comprising:

forming a polishing element of the polishing article, wherein the polishing element comprises a mixture of a first material and a second material, and wherein forming the polishing element comprises sequential repetitions of:

positioning, according to a predetermined first deposition pattern, a plurality of droplets of a first material precursor across a surface;

positioning, according to a predetermined second deposition pattern, a plurality of droplets of a second material precursor across the surface,

wherein a composition of the second material precursor is different from a composition of the first material precursor,

wherein the first and second material precursors each comprise one or more resin components and a curing agent, and

wherein at least some droplets of the first material precursor and at least some droplets of the second material precursor are positioned relative to one another to allow partial mixing therebetween; and

partially curing the positioned droplets of the first and the second material precursors, by exposure thereof to electromagnetic radiation, to form a partially cured acrylate polymer layer, wherein partially curing each of the positioned droplets of the first material precursor results in the droplet having a contact angle relative to a surface of a previously formed acrylate polymer layer of greater than or equal to 50 degrees.

2. The method of claim 1 , wherein at least one of the one or more resin components of the first material precursor comprises a first oligomer and at least one of the one or more resin components of the second material precursor comprises a second oligomer and the first and second oligomers are each selected from the group consisting of a multifunctional urethane oligomer, a polyester acrylate oligomer, a polyether acrylate oligomer, an epoxy acrylate oligomer, and combinations thereof.

3. The method of claim 2 , wherein one of the one or more resin precursor components of the first material precursor comprises a monomer selected from the group consisting of a monofunctional acrylate monomer, a multifunctional acrylate monomer, and combinations thereof.

4. The method of claim 3 , wherein the curing agent of the first material precursor comprises a photoinitiator selected from the group consisting of benzoin ethers, benzyl ketals, acetyl phenones, alkyl phenones, phosphine oxides, benzophenone compounds, thioxanthone compounds, and combinations thereof, and

and the curing agent of the second material precursor comprises a photoinitiator selected from the group consisting of benzoin ethers, benzyl ketals, acetyl phenones, alkyl phenones, phosphine oxides, benzophenone compounds, thioxanthone compounds, and combinations thereof.

5. The method of claim 3 , wherein a ratio of the first oligomer to the monomer in the first material precursor by weight is between 3:1 to 1:3.

6. The method of claim 1 , wherein partially curing the positioned droplets of the first and second material precursors further cures the previously formed acrylate polymer layer disposed therebeneath.

7. The method of claim 1 , wherein

the one or more resin precursor components of the first material precursor comprise a multifunctional urethane acrylate oligomer and a multifunctional acrylate monomer,

one of the one or more or more resin precursor components of the second material precursor comprises a multifunctional urethane acrylate oligomer,

the curing agent of the first material precursor comprises an amine synergist and a photoinitiator selected from a group consisting of benzophenone compounds and thioxanthone compounds, and

the curing agent of the second material precursor comprises a photoinitiator selected from a group consisting of benzoin ethers, benzyl ketals, acetyl phenones, alkyl phenones, and phosphine oxides.

8. The method of claim 1 , wherein an additive manufacturing system is used to sequentially form a plurality of the partially cured acrylate polymer layers, and wherein a curing atmosphere of the additive manufacturing system is oxygen limited or free of oxygen.

9. The method of claim 1 , further comprising:

dispensing a third material precursor composition to form at least a portion of the polishing article comprising a third material; and

at least partially curing the dispensed third material precursor composition by exposure thereof to electromagnetic radiation to form the third material,

wherein the third material has a transmittance of >35% at wavelengths between 280-399 nm, and a transmittance of >70% at wavelengths between 400-800 nm.

10. The method of claim 9 , wherein the third material precursor composition comprises polymethylmethacrylate (PMMA), an epoxide group containing material, or a combination thereof.

11. A method of forming a polishing article, comprising:

forming a polishing element by sequential repetitions of:

positioning, according to a predetermined first pattern, a plurality of droplets of a first pre-polymer composition, the first pre-polymer composition comprising a multifunctional urethane acrylate oligomer, a first resin precursor component having a glass transition temperature greater than 40° C., and a first curing agent;

positioning, according to a predetermined second pattern, a plurality of droplets of a second pre-polymer composition, the second pre-polymer composition comprising the multifunctional urethane acrylate oligomer and a second resin precursor component having a glass transition temperature of less than or equal to 40° C.,

wherein the droplets of the first pre-polymer composition and the droplets of the second pre-polymer composition are positioned relative to one another to allow partial mixing therebetween; and

partially curing the droplets of the first and second pre-polymer compositions using electromagnetic radiation to form a urethane acrylate polymer layer, wherein partially curing each of the positioned droplets of the first pre-polymer composition results in the droplet having a contact angle relative to a surface of a previously formed urethane acrylate polymer layer of greater than or equal to 50 degrees.

12. The method of claim 11 , wherein the first and second pre-polymer compositions each further comprise a photoinitiator selected from a group consisting of benzoin ethers, benzyl ketals, acetyl phenones, alkyl phenones, phosphine oxides, benzophenone compounds, thioxanthone compounds, and combinations thereof.

13. The method of claim 11 , wherein an additive manufacturing system is used to form the polishing element, and wherein a curing atmosphere of the additive manufacturing system is oxygen limited or free of oxygen.

14. The method of claim 11 , further comprising:

dispensing a plurality of droplets of a third pre-polymer composition to form at least a portion of the polishing article; and

at least partially curing the plurality of droplets of the third pre-polymer composition by exposure thereof to electromagnetic radiation,

wherein the formed portion has a transmittance of >35% at wavelengths between 280-399 nm and a transmittance of >70% at wavelengths between 400-800 nm.

15. The method of claim 11 , wherein the droplets of the first and second pre-polymer compositions are positioned onto a previously formed urethane acrylate polymer layer, and wherein partially curing the droplets of the first and second pre-polymer compositions further cures the previously formed urethane acrylate polymer layer.

16. The method of claim 11 , wherein the droplets of the first and second pre-polymer compositions are exposed to electromagnetic radiation within 1 second or less of contacting a surface of a previously formed acrylate polymer layer.

17. The method of claim 1 , wherein the positioned droplets of the first material precursor and the positioned droplets of the second material precursor form an interdigitated pattern.

18. The method of claim 11 , wherein the positioned droplets of the first pre-polymer composition and the positioned droplets of the second pre-polymer composition form an interdigitated pattern.

19. A method of manufacturing a polishing article, comprising:

forming a polishing element by at least partially mixing a first polymer precursor and a second polymer precursor, wherein the first polymer precursor and the second polymer precursor have different compositions, and wherein at least partially mixing the first polymer precursor and second polymer precursor, comprises:

positioning, according to a first pixel chart, a pattern of droplets of the first polymer precursor on a previously formed polymer layer;

positioning, according to a second pixel chart, a pattern of droplets of the second polymer precursor on the previously formed polymer layer,

wherein at least some droplets of the first polymer precursor and at least some droplets of the second polymer precursor are positioned relative to one another to allow partial mixing therebetween; and

exposing the positioned droplets of the first and second polymer precursors to form a partially cured polymer layer, wherein exposing each of the positioned droplets of the first polymer precursor results in the droplet having a contact angle relative to a surface of a previously formed partially cured polymer layer of greater than or equal to 50 degrees.

20. The method of claim 19 , wherein the positioned droplets of the first pre-polymer composition and the positioned droplets of the second pre-polymer composition form an interdigitated pattern.

21. The method of claim 19 , wherein partially curing the droplets of the first and second pre-polymer compositions forms an interpenetrating polymer network within the polishing element.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 3, 2016
From: BAJAJ, RAJEEV; REDFIELD, DANIEL; ORILALL, MAHENDRA C.; FU, BOYI; CHOCKALINGAM, ASHWIN
To: APPLIED MATERIALS, INC
Reel/Frame 038447/0602 →
Continuity (6)
Continuation In Part 14920801 · Oct 22, 2015
Continuation In Part 14887240 · Oct 19, 2015
Continuation In Part 14885950 · Oct 16, 2015
Provisional Application 62065270 · Oct 17, 2014
Provisional Application 62065193 · Oct 17, 2014
Related Publication 20160136787A1 · May 19, 2016
Cited By (1)
US 12,686,098