IP Library Granted Patent US 10,370,606
Granted Patent B2
US 10,370,606 · App. 15/028,261 · Granted Aug 6, 2019

Non-equilibrium plasma-assisted method and system for reformulating and/or reducing tar concentration in gasification derived gas product

Inventors: Islam Gomaa (Ottawa, CA); Thomas Nunnally (Philadelphia, PA); Andreas Tsangaris (Ottawa, CA); Graeme Hay (Kanata, CA); Zhiyuan Shen (Ottawa, CA)
Assignee: Plasco Conversion Technologies Inc.
C10K3/005C10K3/006H05H1/2406H05H1/28H05H1/44C10J2300/1618H05H2001/4607H05H2001/481H05H2240/20H05H2245/121
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Quick Facts
Patent No.
US 10,370,606
App. No.
15/028,261
Granted
Aug 6, 2019
Kind
B2
Abstract

A method and apparatus is described for reformulating raw gas and/or reducing and/or converting the tar in a raw gas from a gasification reaction. More specifically, a gas reformulating system having a gas reformulating chamber, one or more sources of or means for generating non-equilibrium plasma, and optionally one or more oxygen source(s) inputs and control system is provided. Methods of reformulation and/or reducing the tar concentration in a raw gas from a gasification reaction that uses non-equilibrium plasma are also provided.

Claims (24)

1. A method for reformulating a raw gas from a gasification reaction comprising the steps of:

a. removing particulates from the raw gas to obtain a particulate-free raw gas;

b. delivering the particulate-free raw gas to a mixing chamber;

c. injecting air pre-heated to a temperature of between 300-400° C. into the mixing chamber to obtain a mixture;

d. maintaining the mixture in the mixing chamber for a residence time sufficient to raise the temperature of the mixture to about 650-950° C. by partial thermal oxidation to obtain a pre-heated mixture;

e. contacting the pre-heated mixture with an electrical discharge such that a non-equilibrium plasma is formed, thereby producing a reformulated gas; and

f. removing the reformulated gas from the chamber.

2. The method of claim 1 , wherein the non-equilibrium plasma is formed by at least one of dielectric barrier discharge, gliding arc, direct-current and pulsed coronas, corona discharge, microwave plasma, electron-beam, micro-discharge and Radio Frequency (RF)-driven discharge.

3. The method of claim 1 comprising an addition of one or more process additives.

4. The method of claim 1 , wherein one or more process additives are added concurrently with formation of the non-equilibrium plasma within the mixture.

5. The method of claim 1 , comprising exposing one or more of the particulate-free raw gas, the mixture, or the reformulated gas to a catalyst.

6. The method of claim 1 further comprising adjusting an air to the particulate-free raw gas ratio to obtain the mixture.

7. The method of claim 6 comprising adjusting the air to the particulate-free raw gas ratio to between about 0.2 to about 0.6.

8. The method of claim 6 comprising adjusting the air to the particulate-free raw gas ratio to between about 0.3 to about 0.5.

9. The method of claim 6 , wherein air to the particulate-free raw gas ratio is adjusted based on reformulated gas quality.

10. The method of claim 6 , wherein air to the particulate-free raw gas ratio is adjusted to maintain a lower heating value (LHV) of the reformulated gas within a specific range.

11. The method of claim 10 , wherein the specific range is between 1.2 MJ/Nm 3 and 3.9 MJ/Nm 3 .

12. The method of claim 10 , wherein the specific range is between 3.4 MJ/Nm 3 and 3.7 MJ/Nm 3 .

13. The method of claim 10 , wherein the specific range is between 1.2 MJ/Nm 3 and 3.9 MJ/Nm 3 .

14. The method of claim 10 , wherein the LHV is about 3 MJ/Nm 3 .

15. A method for reformulating a raw gas from a gasification reaction comprising the steps of:

a. mixing the raw gas with air pre-heated to a temperature of between 300-400° C. to obtain a mixture;

b. maintaining the mixture in a mixing chamber for a residence time sufficient to raise the temperature of the mixture to about 650-950° C. by partial thermal oxidation to obtain a pre-heated mixture; and

c. directly contacting the pre-heated mixture with a gliding arc discharge, thereby producing a reformulated gas.

Assignments (6)
SECURITY INTEREST Recorded Jan 5, 2022
From: OMNI CONVERSION TECHNOLOGIES INC.; PLASCOENERGY IP HOLDINGS, S.L.; PLASCOENERGY INTERNATIONAL INC.; PLASCO BAHAMAS LTD.; PLASCO U.S. INC.; OMNI SPC 1 LTD.; OMNI CT (U.S.) INC.
To: CANADIAN WATER PROJECTS INC.
Reel/Frame 058559/0601 →
SECURITY INTEREST Recorded Dec 29, 2021
From: OMNI CONVERSION TECHNOLOGIES INC.; PLASCOENERGY IP HOLDINGS, S.L.; PLASCOENERGY INTERNATIONAL INC.; PLASCO BAHAMAS LTD.; PLASCO U.S. INC.; OMNI SPC 1 LTD.; OMNI CT (U.S.) INC.
To: CANADIAN WATER PROJECTS INC.
Reel/Frame 058496/0176 →
SECURITY INTEREST Recorded Dec 22, 2021
From: OMNI CONVERSION TECHNOLOGIES INC.; PLASCOENERGY IP HOLDINGS, S.L.; PLASCOENERGY INTERNATIONAL INC.; PLASCO BAHAMAS LTD.; PLASCO U.S. INC.; OMNI SPC 1 LTD.; OMNI CT (U.S.) INC.
To: NORTH SHORE POWER GROUP INC.
Reel/Frame 058464/0841 →
MERGER Recorded Nov 23, 2021
From: PLASCO CONVERSION TECHNOLOGIES INC.
To: OMNI CONVERSION TECHNOLOGIES INC.
Reel/Frame 058901/0828 →
CHANGE OF NAME Recorded Apr 16, 2019
From: PLASCO ENERGY GROUP INC.
To: PLASCO CONVERSION TECHNOLOGIES INC.
Reel/Frame 048919/0223 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 8, 2016
From: GOMAA, ISLAM; NUNNALLY, THOMAS; TSANGARIS, ANDREAS; HAY, GRAEME; SHEN, ZHIYUAN
To: PLASCO ENERGY GROUP INC., A CANADIAN CORPORATION
Reel/Frame 040605/0720 →
Continuity (2)
Provisional Application 61889104 · Oct 10, 2013
Related Publication 20160244683A1 · Aug 25, 2016