Tire uniformity improvement through modified sampling of uniformity parameters
View Patent ↗Methods and systems for improving tire uniformity through identification of uniformity attributes, such as process harmonics are provided. More particularly, uniformity measurements acquired according to a non-uniform sampling pattern can be obtained and analyzed to estimate one or more process harmonics (e.g. the magnitude of the process harmonic). The non-uniform sampling pattern can specify the acquisition of uniformity measurements in a varying or irregular manner about one or more revolutions of the tire. For instance, the non-uniform sampling pattern can specify a random spacing between data points. The uniformity attributes estimated from the uniformity measurements can be used to modify the manufacture of tires to improve tire uniformity.
1. A system for improving the uniformity of a tire, the system comprising:
a uniformity measurement machine configured to obtain uniformity measurements for the tire according to a non-uniform sampling pattern for one or more revolutions of a tire, the non-uniform sampling pattern having a plurality of data points; and
one or more computing devices coupled to the measurement machine, the one or more computing devices comprising one or more processors and at least one non-transitory computer readable medium, the at least one non-transitory computer readable medium storing computer-readable instructions that, when executed by the one or more processors, cause the one or more processors to perform operations, the operations comprising estimating a harmonic component of the uniformity parameter using the plurality of uniformity measurements;
wherein the non-uniform sampling pattern specifies an unequal spacing between the plurality of data points.
2. The system of claim 1 , wherein the non-uniform sampling pattern specifies a random spacing between the plurality of data points.
3. The system of claim 1 , wherein the plurality of uniformity measurements are acquired according to the sampling pattern using varying rotational speeds of a tire.
4. The system of claim 1 , wherein the plurality of uniformity measurements are obtained for a plurality for the one or more tires, the plurality of revolutions comprising a first revolution and a second revolution.
5. The system of claim 4 , wherein the non-uniform sampling pattern specifies a first pattern of data points for the second revolution and a second pattern of data points for the second revolution, the first pattern of data points having a different spacing between data points than the second patter of data points.
6. The system of claim 4 , wherein the non-uniform sampling pattern specifies a first target circumference for the first revolution and a second target circumference for the second revolution, the first target circumference being different from the second target circumference.
7. The system of claim 1 , wherein the harmonic component comprises a process harmonic.