IP Library Granted Patent US 10,290,412
Granted Patent B2
US 10,290,412 · App. 15/036,786 · Granted May 14, 2019

Vertical inductor for WLCSP

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Quick Facts
Patent No.
US 10,290,412
App. No.
15/036,786
Granted
May 14, 2019
Kind
B2
Abstract

Embodiments of the invention include a microelectronic device and methods of forming a microelectronic device. In an embodiment the microelectronic device includes a semiconductor die and an inductor that is electrically coupled to the semiconductor die. The inductor may include one or more conductive coils that extend away from a surface of the semiconductor die. In an embodiment each conductive coils may include a plurality of traces. For example, a first trace and a third trace may be formed over a first dielectric layer and a second trace may be formed over a second dielectric layer and over a core. A first via through the second dielectric layer may couple the first trace to the second trace, and a second via through the second dielectric layer may couple the second trace to the third trace.

Claims (9)

1. A microelectronic device, comprising:

a semiconductor die; and

an inductor electrically coupled to the semiconductor die, wherein the inductor includes one or more conductive coils that extend away from a surface of the semiconductor die, wherein the one or more conductive coils are formed around a core, and wherein one or more of the conductive coils contacts the core.

2. The microelectronic device of claim 1 , wherein the one or more conductive coils comprise a plurality of traces electrically coupled to each other by one or more vias.

3. The microelectronic device of claim 2 , wherein the plurality of traces in the conductive coil comprises a first trace and a third trace formed over a first dielectric layer and a second trace formed over a second dielectric layer and over the core, and wherein a first via through the second dielectric layer couples the first trace to the second trace, and a second via through the second dielectric layer couples the second trace to the third trace.

4. The microelectronic device of claim 1 , wherein the core is a magnetic material.

5. The microelectronic device of claim 4 , wherein the core is nickel or cobalt.

6. The microelectronic device of claim 4 , wherein the core is a composite material.

7. The microelectronic device of claim 6 , wherein the composite material include a polymer matrix comprising epoxy, polyimide, benzocyclobutene (BCB), and a filler material comprising nickel-zinc ferrites, manganese-zinc ferrites, nickel, iron, or cobalt.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 8, 2021
From: INTEL IP CORPORATION
To: INTEL CORPORATION
Reel/Frame 056524/0373 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 14, 2016
From: WOLTER, ANDREAS; MEYER, THORSTEN; KNOBLINGER, GERHARD
To: INTEL IP CORPORATION
Reel/Frame 039162/0225 →