Polishing agent, polishing method and method for manufacturing semiconductor integrated circuit device

1. A polishing agent comprising:

cerium oxide particles;

a water-soluble polyamine;

potassium hydroxide;

at least one selected from an organic acid and a salt thereof; and

water,

wherein the polishing agent has a pH of 10 or more,

the water-soluble polyamine is a water-soluble polyether polyamine having a weight average molecular weight of from 100 to 2,000, and

the organic acid comprises gluconic acid or N-[tris(hydroxymethyl)methyl]glycine.

2. The polishing agent according to claim 1 , wherein an amount of the water-soluble polyamine is from 0.001 to 2.0 mass % based on a total amount of the polishing agent.

3. The polishing agent according to claim 1 , wherein the organic acid further comprises a monocarboxylic acid.

4. The polishing agent according to claim 1 , wherein an amount of the at least one selected from the organic acid and the salt thereof is from 0.001 to 2.0 mass % based on a total amount of the polishing agent.

5. The polishing agent according to claim 1 , wherein an amount of the potassium hydroxide is from 0.001 to 2.0 mass % based on a total amount of the polishing agent.

6. The polishing agent according to claim 1 , wherein an amount of the cerium oxide particles is from 0.01 to 5.0 mass % based on a total amount of the polishing agent.

7. A polishing agent comprising:

cerium oxide particles;

a water-soluble polyamine;

potassium hydroxide;

at least one selected from an organic acid and a salt thereof; and

water,

wherein the polishing agent has a pH of 10 or more,

the water-soluble polyamine is a water-soluble polyether polyamine having a weight average molecular weight of from 100 to 2,000, and

an amount of the at least one selected from the organic acid and the salt thereof is from 0.001 to 2.0 mass % based on a total amount of the polishing agent.

8. The polishing agent according to claim 7 , wherein an amount of the water-soluble polyamine is from 0.001 to 2.0 mass % based on the total amount of the polishing agent.

9. The polishing agent according to claim 7 , wherein the organic acid further comprises a monocarboxylic acid.

10. The polishing agent according to claim 7 , wherein an amount of the potassium hydroxide is from 0.001 to 2.0 mass % based on the total amount of the polishing agent.

11. The polishing agent according to claim 7 , wherein an amount of the cerium oxide particles is from 0.01 to 5.0 mass % based on the total amount of the polishing agent.

12. A polishing method comprising:

supplying the polishing agent according to claim 1 to a polishing pad; and

bringing the polishing pad into contact with a surface to be polished to perform polishing by relative movement therebetween,

wherein material of the surface to be polished comprises silicon oxide.

13. A method for manufacturing a semiconductor integrated circuit device, comprising polishing a surface to be polished of a semiconductor integrated circuit device, by the polishing method according to claim 12 .

14. A polishing method comprising:

supplying the polishing agent according to claim 7 to a polishing pad; and

bringing the polishing pad into contact with a surface to be polished to perform polishing by relative movement therebetween,

wherein material of the surface to be polished comprises silicon oxide.

15. A method for manufacturing a semiconductor integrated circuit device, comprising polishing a surface to be polished of a semiconductor integrated circuit device, by the polishing method according to claim 14 .