Semiconductor device and radio frequency module formed on high resistivity substrate

1. A semiconductor device comprising:

a high resistivity substrate having a first conductive type;

a deep well region having a second conductive type and arranged in the high resistivity substrate;

a low concentration well region having the first conductive type and arranged on the deep well region;

a transistor arranged on the low concentration well region;

a device isolation region arranged in the high resistivity substrate to surround the low concentration well region and comprising a deep trench device isolation region and a shallow trench device isolation region arranged on the deep trench device isolation region;

a second well region having the second conductive type and arranged to surround the device isolation region;

a second device isolation region arranged to surround the second well region and comprising a second deep trench device isolation region and a second shallow trench device isolation region arranged on the second deep trench device isolation region; and

a third well region having the first conductive type and arranged to surround the second device isolation region,

wherein the deep well region is arranged wider than the low concentration well region, and the deep trench device isolation region extends through the deep well region so as to be deeper than the deep well region and has a slit to electrically connect the deep well region with the second well region.

2. The semiconductor device of claim 1 , wherein the transistor comprises:

a gate structure arranged on the low concentration well region;

a source region and a drain region each arranged at surface portions of the low concentration well region, wherein the source region and the drain region are arranged at opposite sides of the gate structure; and

a high concentration impurity region arranged on one side of the source region.

3. The semiconductor device of claim 2 , wherein the source region is of the second conductive type;

the high concentration impurity region is of the first conductive type; and

the source region and the high concentration impurity region are electrically connected with each other.

4. The semiconductor device of claim 1 , wherein the low concentration well region has an impurity concentration in a range of about 1E+10 to about 1E+12 ions/cm 2 .

5. The semiconductor device of claim 1 , wherein

a second high concentration impurity region having the second conductive type is arranged on the second well region.

6. The semiconductor device of claim 1 , wherein a surface portion of the high resistivity substrate is the low concentration well region.

7. A semiconductor device comprising:

a high resistivity substrate having a first conductive type;

a deep well region having a second conductive type and arranged in the high resistivity substrate;

a low concentration well region having the first conductive type and arranged on the deep well region;

a plurality of transistors arranged on the low concentration well region and disposed in a multi-finger structure in which the plurality of transistors is electrically connected with one another;

a device isolation region having a ring shape to surround the low concentration well region and comprising a deep trench device isolation region and a shallow trench device isolation region arranged on the deep trench device isolation region;

a second well region having the second conductive type and arranged to surround the device isolation region;

a second device isolation region arranged to surround the second well region and comprising a second deep trench device isolation region and a second shallow trench device isolation region arranged on the second deep trench device isolation region; and

a third well region having the first conductive type and arranged to surround the second device isolation region,

wherein the deep well region is arranged wider than the low concentration well region, and the deep trench device isolation region extends through the deep well region so as to be deeper than the deep well region and has a slit to electrically connect the deep well region with the second well region.

8. The semiconductor device of claim 7 , wherein the low concentration well region has an impurity concentration in a range of about 1E+10 to about 1E+12 ions/cm 2 .

9. The semiconductor device of claim 7 , wherein a high concentration impurity region having the first conductive type is arranged between source regions of transistors disposed adjacent with each other among the plurality of transistors; and

the high concentration impurity region and the source regions of the adjacent transistors are electrically connected with one another.

10. The semiconductor device of claim 7 , wherein

a second high concentration impurity region having the second conductive type is arranged on the second well region.

11. The semiconductor device of claim 10 , wherein

a third high concentration impurity region having the first conductive type is arranged on the third well region.

12. A radio frequency (RF) module comprising:

an RF switching device arranged on a high resistivity substrate;

an RF active device arranged on the high resistivity substrate;

an RF passive device arranged on the high resistivity substrate; and

a control device arranged on the high resistivity substrate,

wherein the RF switching device comprises:

a deep well region having a second conductive type and arranged in the high resistivity substrate;

a low concentration well region having a first conductive type and arranged on the deep well region;

a transistor arranged on the low concentration well region;

a device isolation region arranged in the high resistivity substrate to surround the low concentration well region and comprising a deep trench device isolation region and a shallow trench device isolation region arranged on the deep trench device isolation region;

a second well region having the second conductive type and arranged to surround the device isolation region;

a second device isolation region arranged to surround the second well region and comprising a second deep trench device isolation region and a second shallow trench device isolation region arranged on the second deep trench device isolation region; and

a third well region having the first conductive type and arranged to surround the second device isolation region,

wherein the deep well region is arranged wider than the low concentration well region, and the deep trench device isolation region extends through the deep well region so as to be deeper than the deep well region and has a slit to electrically connect the deep well region with the second well region.