IP Library Granted Patent US 9,448,460
Granted Patent B2
US 9,448,460 · App. 15/046,725 · Granted Sep 20, 2016

Imaging using metamaterials

Inventors: Jung-Tsung Shen (St. Louis, MO); Yuecheng Shen (St. Louis, MO); Lihong Wang (St. Louis, MO)
Assignee: WASHINGTON UNIVERSITY
G02F1/3501H04N5/2256
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Quick Facts
Patent No.
US 9,448,460
App. No.
15/046,725
Granted
Sep 20, 2016
Kind
B2
Abstract

A system for imaging an object is provided. The system includes a light source configured to emit light having a predetermined wavelength towards the object. The system further includes a metalens including a metallic film having a plurality of slits defined therethrough, the plurality of slits having a width a and a periodicity d that are both less than the predetermined wavelength, wherein the object is positioned between the light source and the metalens. The system further includes a detector configured to acquire measurements indicative of light transmitted through the metalens, and a computing device communicatively coupled to the detector and configured to reconstruct an image of the object based on the acquired measurements.

Claims (15)

1. A system for imaging an object, said system comprising:

a light source configured to emit light having a predetermined wavelength towards the object;

a metalens comprising a metallic film having a plurality of slits defined therethrough, the plurality of slits having a width a and a periodicity d that are both less than the predetermined wavelength, wherein the object is positioned between said light source and said metalens;

a detector configured to acquire measurements indicative of light transmitted through said metalens; and

a computing device communicatively coupled to said detector and configured to reconstruct an image of the object based on the acquired measurements.

2. A system in accordance with claim 1 , wherein said metalens further comprises a plurality of dielectric elements positioned within said plurality of slits.

3. A system in accordance with claim 2 , wherein said plurality of dielectric elements are substantially optically transparent.

4. A system in accordance with claim 1 , wherein said plurality of slits are unfilled.

5. A system in accordance with claim 1 , wherein said computing device is configured to reconstruct an image having a resolution at least a factor of two smaller than the predetermined wavelength.

6. A system in accordance with claim 1 , wherein said detector is positioned proximate a detection slit of said plurality of slits.

7. A system in accordance with claim 1 , further comprising a waveguide positioned between said metalens and said detector.

8. A system in accordance with claim 1 , wherein the object is positioned such that at least a portion of the object lies within evanescent bulges formed at ends of the plurality of slits.

9. A system in accordance with claim 1 , wherein the detector is a photodetector.

10. A system in accordance with claim 1 , wherein the detector further comprises one or more optical fibers to collect light passing through the metalens.

11. A system in accordance with claim 1 , wherein said detector comprises a plurality of detectors.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 18, 2016
From: SHEN, JUNG-TSUNG; WANG, LIHONG; SHEN, YUECHENG
To: WASHINGTON UNIVERSITY
Reel/Frame 037768/0759 →
Continuity (4)
Division 14047459 · Oct 7, 2013
Continuation In Part 13716531 · Dec 17, 2012
Provisional Application 61577760 · Dec 20, 2011
Related Publication 20160161826A1 · Jun 9, 2016