Coating apparatus and coating method
View Patent ↗According to one embodiment, provided is a coating apparatus. The coating apparatus includes a first discharger, a second discharger, and a third discharger. The first discharger discharges a first liquid on a top surface of a substrate. In addition, the second discharger discharges a second liquid of which surface tension is higher than surface tension of the first liquid on the top surface of the substrate. In addition, the third discharger is disposed in a side outer than the first discharger in the substrate and discharges a gas on the top surface of the substrate.
1. A coating method comprising:
ejecting a first liquid on a top surface of a rotating substrate;
ejecting a second liquid on the top surface of the rotating substrate, surface tension of the second liquid being higher than surface tension of the first liquid;
ejecting a gas on the top surface of the rotating substrate at a position radially further away from a center of the rotating substrate than another position on the rotating substrate where the second liquid has been ejected; and
ejecting the second liquid while moving from an outer circumferential side of the rotating substrate toward the center of the rotating substrate,
wherein ejecting the first liquid occurs after both ejecting the second liquid and ejecting the gas have been completed.
2. The coating method according to claim 1 , further comprising:
ejecting an amount of the second liquid corresponding to a radial position of the substrate.
3. The coating method according to claim 1 , further comprising:
moving a nozzle that ejects the second liquid at a speed corresponding to a radial position of the substrate.
4. The coating method according to claim 1 , further comprising:
ejecting the gas and the second liquid simultaneously.
5. The coating method according to claim 1 , further comprising:
ending the ejection of the second liquid when the second liquid has been ejected on the center of the substrate.
6. The coating method according to claim 1 , further comprising:
ejecting the second liquid so that, the closer to an outer circumferential side of the substrate, the more the second liquid is ejected.
7. The coating method according to claim 1 , wherein
the first liquid is a resist, and
the second liquid is a thinner.