Semiconductor device and method for manufacturing the same

1. A semiconductor device comprising:

a first semiconductor chip;

a plurality of first electrodes each having a depression in a central portion of an upper surface thereof facing away from the first semiconductor chip, the plurality of first electrodes being located at an upper surface of the first semiconductor chip;

a plurality of second electrodes located at a lower surface of the first semiconductor chip and electrically connected to the plurality of first electrodes;

a first resist layer located at the upper surface of the first semiconductor chip so as to surround the plurality of first electrodes, wherein the plurality of first electrodes are located within an inner perimeter of the first resist layer and spaced from the first resist layer and from one another;

a second resist layer located at the lower surface of the first semiconductor chip; and

a second semiconductor chip having an electrode in contact with the depression of one of the plurality of first electrodes and a resist layer in contact with the first resist layer.

2. The device according to claim 1 , wherein

the height of the upper surfaces of the plurality of first electrodes above the upper surface of the first semiconductor chip is lower than the height of an upper surface of the first resist layer above the first semiconductor chip.

3. The device according to claim 1 , wherein

the outer perimeter of the plurality of first electrodes comprises a first diameter, and

the inner perimeter of the first resist layer comprises a second diameter greater than the first diameter.

4. The device according to claim 1 , wherein

the plurality of second electrodes are provided on the lower surface of the first semiconductor chip and extend within the first semiconductor chip towards the upper surface of the first semiconductor chip.

5. The device according to claim 1 , wherein

the second resist layer comprises a plurality of resist portions spaced from the plurality of second electrode.

6. The device according to claim 1 , wherein the plurality of second electrodes are electrically connected to the plurality of first electrodes through a wiring layer on the first semiconductor chip.

7. The device according to claim 1 , further comprising:

an interlayer dielectric located at the upper surface of the first semiconductor chip, having an opening, wherein

the plurality of first electrodes are provided in the opening of the interlayer dielectric and on the interlayer dielectric.

8. A semiconductor device comprising:

a first chip; and

a second chip located on the first chip,

wherein

each of the first and second chips includes:

a substrate,

a plurality of first electrodes each having a depression in a central portion of an upper surface thereof facing away from the substrate, the plurality of electrodes being located at an upper surface of the substrate,

a plurality of second electrodes located at a lower surface of the substrate and electrically connected to the plurality of first electrodes,

a first resist layer located at the upper surface of the substrate so as to surround the plurality of first electrodes, wherein the plurality of first electrodes are located within an inner perimeter of the first resist layer and spaced from the first resist layer and from one another, and

a second resist layer located at the lower surface of the substrate, and

the second chip is located on the first chip so that the plurality of second electrodes of the second chip come into contact with the plurality of first electrodes of the first chip and the second resist layer of the second chip is in contact with the first resist layer of the first chip.

9. The device according to claim 8 , wherein

the second chip is located on the first chip so that the second resist layer of the second chip comes into contact with the first resist layer of the first chip.

10. The device according to claim 8 , wherein the second resist comprises a plurality of resist portions and the plurality of resist portions are spaced from the second electrode.

11. The device according to claim 8 , wherein the first resist layer comprises an opening therein, and a plurality of first electrodes are located within the opening and spaced from one another and from the resist layer adjacent to the opening.

12. The device according to claim 8 , wherein the first resist layer extends further from the substrate than the plurality of first electrodes extends from the substrate.